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Results: 1-25 | 26-50 | 51-57
Results: 1-25/57
ELECTRON-BEAM STUDY OF NANOMETER PERFORMANCES OF THE SAL-601 CHEMICALLY AMPLIFIED RESIST
Authors: GENTILI M GERARDINO A DIFABRIZIO E
Citation: M. Gentili et al., ELECTRON-BEAM STUDY OF NANOMETER PERFORMANCES OF THE SAL-601 CHEMICALLY AMPLIFIED RESIST, JPN J A P 1, 37(8), 1998, pp. 4632-4635
A NOVEL X-RAY MASK FOR MIX-AND-MATCH OF OPTICAL AND X-RAY-LITHOGRAPHYAPPLIED IN SOI DEVICE FABRICATION
Authors: CHOI SS KIM JS DIFABRIZIO E GENTILI M CHUNG HB YOO HJ KIM BW
Citation: Ss. Choi et al., A NOVEL X-RAY MASK FOR MIX-AND-MATCH OF OPTICAL AND X-RAY-LITHOGRAPHYAPPLIED IN SOI DEVICE FABRICATION, Journal of the Korean Physical Society, 32(5), 1998, pp. 727-730
ZNSE ZNS SINGLE QUANTUM-WIRE HETEROSTRUCTURES EMITTING IN THE NEAR-ULTRAVIOLET REGION/
Authors: RINALDI R TURCO C LOVERGINE N CINGOLANI R VASANELLI L DIFABRIZIO E GRELLA L GENTILI M
Citation: R. Rinaldi et al., ZNSE ZNS SINGLE QUANTUM-WIRE HETEROSTRUCTURES EMITTING IN THE NEAR-ULTRAVIOLET REGION/, PHYSICS OF LOW-DIMENSIONAL STRUCTURES, 1-2, 1998, pp. 199-204
FABRICATION OF PHASE MASKS WITH SUBHALF MICRON RESOLUTION BY ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L VANINETTI F FONTANA F
Citation: E. Difabrizio et al., FABRICATION OF PHASE MASKS WITH SUBHALF MICRON RESOLUTION BY ELECTRON-BEAM LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 121-124
DOT-IMMUNOBINDING ASSAY FOR DETECTION OF MITE ANTIGENS IN HOUSE-DUST SAMPLES
Authors: MISTRELLO G GENTILI M RONCAROLO D ANTONIOTTI P OTTOBONI F FALAGIANI P
Citation: G. Mistrello et al., DOT-IMMUNOBINDING ASSAY FOR DETECTION OF MITE ANTIGENS IN HOUSE-DUST SAMPLES, Journal of medical entomology, 35(2), 1998, pp. 143-147
LOCALIZATION OF THE MESSENGER-RNA FOR THE ANGIOTENSIN-II RECEPTOR SUBTYPE-2 (AT2) IN FOLLICULAR GRANULOSA-CELLS OF THE RAT OVARY BY NONRADIOACTIVE IN-SITU HYBRIDIZATION
Authors: OBERMULLER N SCHLAMP D HOFFMANN S GENTILI M INAGAMI T GRETZ N WEIGEL M
Citation: N. Obermuller et al., LOCALIZATION OF THE MESSENGER-RNA FOR THE ANGIOTENSIN-II RECEPTOR SUBTYPE-2 (AT2) IN FOLLICULAR GRANULOSA-CELLS OF THE RAT OVARY BY NONRADIOACTIVE IN-SITU HYBRIDIZATION, The Journal of histochemistry and cytochemistry, 46(8), 1998, pp. 865-870
BEAM QUALITY ENHANCEMENT FOR A RADIOFREQUENCY EXCITED ANNULAR CO2-LASER
Authors: LAPUCCI A CIOFINI M MASCALCHI S DIFABRIZIO E GENTILI M
Citation: A. Lapucci et al., BEAM QUALITY ENHANCEMENT FOR A RADIOFREQUENCY EXCITED ANNULAR CO2-LASER, Applied physics letters, 73(18), 1998, pp. 2549-2551
CLONIDINE FOR INTRAVENOUS REGIONAL ANESTHESIA (IVRA)
Authors: GENTILI M BONNET F BERNARD JM
Citation: M. Gentili et al., CLONIDINE FOR INTRAVENOUS REGIONAL ANESTHESIA (IVRA), Anesthesiology, 89(3A), 1998, pp. 826-826
SEDATION DEPENDS ON THE EXTENSION OF SENSORY BLOCK INDUCED BY SPINAL-ANESTHESIA
Authors: GENTILI M HUU PC ENEL D HOLLANDE J BONNET F
Citation: M. Gentili et al., SEDATION DEPENDS ON THE EXTENSION OF SENSORY BLOCK INDUCED BY SPINAL-ANESTHESIA, Anesthesiology, 89(3A), 1998, pp. 860-860
PERIPHERAL ANALGESIA WITH CLONIDINE AND MORPHINE ON THE SCIATIC-NERVEOF RATS
Authors: FLETCHER D ZLOTINE N GENTILI M MAZOIT X SAMII K
Citation: D. Fletcher et al., PERIPHERAL ANALGESIA WITH CLONIDINE AND MORPHINE ON THE SCIATIC-NERVEOF RATS, Anesthesiology, 89(3A), 1998, pp. 1132-1132
MICROPHOTONIC DEVICES FABRICATED BY SILICON MICROMACHINING TECHNIQUES
Authors: DIFABRIZIO E BACIOCCHI M GENTILI M GRELLA L MASTROGIACOMO L
Citation: E. Difabrizio et al., MICROPHOTONIC DEVICES FABRICATED BY SILICON MICROMACHINING TECHNIQUES, JPN J A P 1, 36(12B), 1997, pp. 7757-7762
FABRICATION OF 5 NM RESOLUTION ELECTRODES FOR MOLECULAR DEVICES BY MEANS OF ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L MORALES P
Citation: E. Difabrizio et al., FABRICATION OF 5 NM RESOLUTION ELECTRODES FOR MOLECULAR DEVICES BY MEANS OF ELECTRON-BEAM LITHOGRAPHY, JPN J A P 2, 36(1AB), 1997, pp. 70-72
NANOLITHOGRAPHY PERFORMANCES OF ULTRAVIOLET-III CHEMICALLY AMPLIFIED POSITIVE RESIST
Authors: GRELLA L GENTILI M DIFABRIZIO E BACIOCCHI M MASTROGIACOMO L MAGGIORA R SCOPA L
Citation: L. Grella et al., NANOLITHOGRAPHY PERFORMANCES OF ULTRAVIOLET-III CHEMICALLY AMPLIFIED POSITIVE RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2596-2600
NANOMETER BIODEVICE FABRICATION BY ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L BACIOCCHI M GENTILI M ASCOLI C CAPPELLA B FREDIANI C MORALES P
Citation: E. Difabrizio et al., NANOMETER BIODEVICE FABRICATION BY ELECTRON-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2892-2896
RENIN SYNTHESIS IN HUMAN GRANULOSA-CELLS
Authors: WEIGEL M GENTILI M SCHMIDT R SCHLEICH HG MELCHERT F
Citation: M. Weigel et al., RENIN SYNTHESIS IN HUMAN GRANULOSA-CELLS, Human reproduction, 12, 1997, pp. 220-220
GEL FORMATION THEORY APPROACH FOR THE MODELING OF NEGATIVE CHEMICALLYAMPLIFIED E-BEAM RESISTS
Authors: PATSIS G RAPTIS I GLEZOS N ARGITIS P HATZAKIS M AIDINIS CJ GENTILI M MAGGIORA R
Citation: G. Patsis et al., GEL FORMATION THEORY APPROACH FOR THE MODELING OF NEGATIVE CHEMICALLYAMPLIFIED E-BEAM RESISTS, Microelectronic engineering, 35(1-4), 1997, pp. 157-160
PROXIMITY CORRECTION FOR E-BEAM PATTERNED SUB-500NM DIFFRACTIVE OPTICAL-ELEMENTS
Authors: GRELLA L DIFABRIZIO E GENTILI M BACIOCCHI M MAGGIORA R
Citation: L. Grella et al., PROXIMITY CORRECTION FOR E-BEAM PATTERNED SUB-500NM DIFFRACTIVE OPTICAL-ELEMENTS, Microelectronic engineering, 35(1-4), 1997, pp. 495-498
A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L CHOI SS JEON YJ YOO HJ CHUNG HB
Citation: E. Difabrizio et al., A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 553-556
SPECIAL ISSUE ON MICROFABRICATION OF DIFFRACTIVE OPTICAL-ELEMENTS - PREFACE
Authors: GENTILI M
Citation: M. Gentili, SPECIAL ISSUE ON MICROFABRICATION OF DIFFRACTIVE OPTICAL-ELEMENTS - PREFACE, Microelectronic engineering, 34(3-4), 1997, pp. 217-217
INTRAARTICULAR MORPHINE AND CLONIDINE PRODUCE COMPARABLE ANALGESIA BUT THE COMBINATION IS NOT MORE EFFECTIVE
Authors: GENTILI M HOUSSEL P OSMAN M HENEL D JUHEL A BONNET F
Citation: M. Gentili et al., INTRAARTICULAR MORPHINE AND CLONIDINE PRODUCE COMPARABLE ANALGESIA BUT THE COMBINATION IS NOT MORE EFFECTIVE, British Journal of Anaesthesia, 79(5), 1997, pp. 660-661
FREESTANDING ZNSE ZNS QUANTUM WIRES WITH HIGH LUMINESCENCE EFFICIENCY/
Authors: RINALDI R TURCO C LOVERGINE N CINGOLANI R VASANELLI L DIFABRIZIO E GRELLA L GENTILI M DECARO L TAPFER L
Citation: R. Rinaldi et al., FREESTANDING ZNSE ZNS QUANTUM WIRES WITH HIGH LUMINESCENCE EFFICIENCY/, Applied physics letters, 71(26), 1997, pp. 3770-3772
FABRICATION OF HIGH-RESOLUTION FRESNEL ZONE PLATES BY A SINGLE-LAYER RESIST PROCESS
Authors: HIROSHIMA H KOMURO M GENTILI M GRELLA L DIFABRIZIO E MAGGIORA R
Citation: H. Hiroshima et al., FABRICATION OF HIGH-RESOLUTION FRESNEL ZONE PLATES BY A SINGLE-LAYER RESIST PROCESS, JPN J A P 1, 35(12B), 1996, pp. 6447-6451
COMPARISON BETWEEN OUTDOOR AND INDOOR AIRBORNE ALLERGENIC ACTIVITY
Authors: DAMATO G RUSSO M LICCARDI G SAGGESE M GENTILI M MISTRELLO G DAMATO M FALAGIANI P
Citation: G. Damato et al., COMPARISON BETWEEN OUTDOOR AND INDOOR AIRBORNE ALLERGENIC ACTIVITY, Annals of allergy, asthma, & immunology, 77(2), 1996, pp. 147-152
ONE-STEP ELECTRON-BEAM LITHOGRAPHY FOR MULTIPURPOSE, DIFFRACTIVE OPTICAL-ELEMENTS WITH 200 NM RESOLUTION
Authors: DIFABRIZIO E GRELLA L BACIOCCHI M GENTILI M PESCHIAROLI D MASTROGIACOMO L MAGGIORA R
Citation: E. Difabrizio et al., ONE-STEP ELECTRON-BEAM LITHOGRAPHY FOR MULTIPURPOSE, DIFFRACTIVE OPTICAL-ELEMENTS WITH 200 NM RESOLUTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3855-3859
APPLICATION OF A REACTION-DIFFUSION MODEL FOR NEGATIVE CHEMICALLY AMPLIFIED RESISTS TO DETERMINE ELECTRON-BEAM PROXIMITY CORRECTION PARAMETERS
Authors: GLEZOS N PATSIS GP RAPTIS I ARGITIS P GENTILI M GRELLA L
Citation: N. Glezos et al., APPLICATION OF A REACTION-DIFFUSION MODEL FOR NEGATIVE CHEMICALLY AMPLIFIED RESISTS TO DETERMINE ELECTRON-BEAM PROXIMITY CORRECTION PARAMETERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4252-4256
Risultati: 1-25 | 26-50 | 51-57