Authors: GESLEY M

Citation: M. Gesley, MASK PATTERNING CHALLENGES FOR DEVICE FABRICATION BELOW 100 NM, Microelectronic engineering, 42, 1998, pp. 7-14

Authors: MURAY A COLBY D TEITZEL R GESLEY M

Citation: A. Muray et al., EXPERIMENTAL EVALUATION OF AN ELECTRON-BEAM PULSE-MODULATED BLANKER (160 MHZ) FOR NEXT-GENERATION ELECTRON-BEAM RASTER SCAN SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2488-2492

Authors: GESLEY M ABBOUD F COLBY D RAYMOND F WATSON S

Citation: M. Gesley et al., ELECTRON-BEAM COLUMN DEVELOPMENTS FOR SUBMICRON LITHOGRAPHY AND NANOLITHOGRAPHY, JPN J A P 1, 32(12B), 1993, pp. 5993-6005

Authors: GESLEY M COLBY D RAYMOND F MCCLURE D ABBOUD F

Citation: M. Gesley et al., ELECTRODYNAMICS OF FAST BEAM BLANKERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2378-2385

Authors: GESLEY M

Citation: M. Gesley, AN ELECTRON-OPTICAL THEORY OF BEAM BLANKING, Review of scientific instruments, 64(11), 1993, pp. 3169-3190