Citation: Mk. Gobbert et al., THE COMBINATION OF EQUIPMENT SCALE AND FEATURE SCALE MODELS FOR CHEMICAL-VAPOR-DEPOSITION VIA A HOMOGENIZATION TECHNIQUE, VLSI design (Print), 6(1-4), 1998, pp. 399-403
Citation: Mk. Gobbert et Ca. Ringhofer, AN ASYMPTOTIC ANALYSIS FOR A MODEL OF CHEMICAL-VAPOR-DEPOSITION ON A MICROSTRUCTURED SURFACE, SIAM journal on applied mathematics, 58(3), 1998, pp. 737-752
Authors:
GOBBERT MK
MERCHANT TP
BORUCKI LJ
CALE TS
Citation: Mk. Gobbert et al., A MULTISCALE SIMULATOR FOR LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION, Journal of the Electrochemical Society, 144(11), 1997, pp. 3945-3951
Citation: Mk. Gobbert et al., MESOSCOPIC SCALE MODELING OF MICROLOADING DURING LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION, Journal of the Electrochemical Society, 143(8), 1996, pp. 2624-2631