Citation: Z. Hens et Wp. Gomes, THE ELECTROCHEMICAL IMPEDANCE OF REVERSIBLE SEMICONDUCTOR ELECTRODES - THE N-INP METHYLVIOLOGEN ELECTRODE AS AN EXAMPLE/, Electrochimica acta, 43(18), 1998, pp. 2577-2587
Citation: Pm. Vereecken et al., THE ELECTROCHEMICAL-BEHAVIOR OF P-TYPE (100)GAAS IN COPPER-SULFATE SOLUTION - INFLUENCE OF SURFACE CONDITIONS, Journal of the Electrochemical Society, 145(9), 1998, pp. 3075-3082
Citation: Z. Hens et Wp. Gomes, ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY AT SEMICONDUCTOR ELECTRODES - THE RECOMBINATION RESISTANCE REVISITED, Journal of electroanalytical chemistry [1992], 437(1-2), 1997, pp. 77-83
Citation: Pm. Vereecken et al., AN IMPROVED PROCEDURE FOR THE PROCESSING OF CHRONOAMPEROMETRIC DATA -APPLICATION TO THE ELECTRODEPOSITION OF CU UPON (100)N-GAAS, Journal of electroanalytical chemistry [1992], 433(1-2), 1997, pp. 19-31
Citation: A. Theuwis et Wp. Gomes, A FUNDAMENTAL-STUDY ON N-IN0.53GA0.47AS AND P-IN0.53GA0.47AS IN H2O2 SOLUTION - ELECTROCHEMICAL-BEHAVIOR AND SELECTIVE ETCHING VS INP, Journal of the Electrochemical Society, 144(4), 1997, pp. 1390-1398
Citation: Pj. Verpoort et al., INVESTIGATION ON THE ELECTROCHEMISTRY AND ETCHING AT THE (100)GAAS-VERTICAL-BAR-HIO3 INTERFACE, Journal of electroanalytical chemistry [1992], 411(1-2), 1996, pp. 67-72
Citation: A. Theuwis et al., CHEMICAL AND ELECTROCHEMICAL INTERACTION OF ACIDIC H2O2 SOLUTIONS WITH (100)INP, Journal of electroanalytical chemistry [1992], 410(1), 1996, pp. 31-42
Citation: Pm. Vereecken et al., ELECTROCHEMICAL REDUCTION VS, VAPOR-DEPOSITION FOR N-GAAS CU SCHOTTKY-BARRIER FORMATION - A COMPARATIVE-STUDY/, Journal of the Chemical Society. Faraday transactions, 92(20), 1996, pp. 4069-4075
Citation: Wp. Gomes et D. Vanmaekelbergh, IMPEDANCE SPECTROSCOPY AT SEMICONDUCTOR ELECTRODES - REVIEW AND RECENT DEVELOPMENTS, Electrochimica acta, 41(7-8), 1996, pp. 967-973
Citation: Ie. Vermeir et Wp. Gomes, THE ETCHING OF INP BY ACIDIC IODINE SOLUTIONS - A KINETIC AND ELECTROCHEMICAL STUDY, Journal of the Electrochemical Society, 143(4), 1996, pp. 1319-1325
Citation: Ie. Vermeir et al., SOME FUNDAMENTAL-ASPECTS OF PROFILE ETCHING AT INP SURFACES, Journal of the Electrochemical Society, 142(9), 1995, pp. 3226-3232
Citation: Pj. Verpoort et al., FUNDAMENTAL-STUDY ON THE SELECTIVE ETCHING OF AL0.25GA0.75AS VERSUS GAAS IN ACIDIC IODINE SOLUTIONS, Journal of the Electrochemical Society, 142(10), 1995, pp. 3589-3595
Citation: Ie. Vermeir et Wp. Gomes, ON THE ETCHING OF INP IN ALKALINE K3FE(CN)6 SOLUTIONS, Journal of electroanalytical chemistry [1992], 365(1-2), 1994, pp. 59-69
Citation: K. Strubbe et Wp. Gomes, THE EFFECT OF HIGH LICL CONCENTRATIONS UPON THE COMPETITION BETWEEN ANODIC DECOMPOSITION AND STABILIZATION OF THE N-GAAS FE2+ ELECTRODE/, Journal of electroanalytical chemistry [1992], 349(1-2), 1993, pp. 429-441
Authors:
VERMEIR IE
GOMES WP
ERNE BH
VANMAEKELBERGH D
Citation: Ie. Vermeir et al., THE ANODIC-DISSOLUTION OF INP STUDIED BY THE OPTOELECTRICAL IMPEDANCEMETHOD .2. INTERACTION BETWEEN ANODIC AND CHEMICAL ETCHING OF INP IN IODIC ACID-SOLUTIONS, Electrochimica acta, 38(17), 1993, pp. 2569-2575
Citation: K. Strubbe et Wp. Gomes, BROMINE-METHANOL AS AN ETCHANT FOR SEMICONDUCTORS - A FUNDAMENTAL-STUDY ON GAP .1. ETCHING BEHAVIOR OF N-TYPE AND P-TYPE GAP, Journal of the Electrochemical Society, 140(11), 1993, pp. 3294-3300
Citation: K. Strubbe et Wp. Gomes, BROMINE-METHANOL AS AN ETCHANT FOR SEMICONDUCTORS - A FUNDAMENTAL-STUDY ON GAP .2. INTERACTION BETWEEN CHEMICAL AND ANODIC ETCHING OF P-TYPE GAP, Journal of the Electrochemical Society, 140(11), 1993, pp. 3301-3305
Citation: Hh. Goossens et Wp. Gomes, (PHOTO)ELECTROCHEMISTRY - A SUITABLE TOOL FOR INVESTIGATING WET ETCHING PROCESSES ON III-V SEMICONDUCTORS, Electrochimica acta, 37(5), 1992, pp. 811-826