Authors:
GRAHN K
XIA Z
KUIVALAINEN P
KARLSTEEN M
WILLANDER M
Citation: K. Grahn et al., EFFECT OF ION-IMPLANTED GERMANIUM PROFILE ON THE CHARACTERISTICS OF SI1-XGEX SI HETEROJUNCTION BIPOLAR-TRANSISTORS/, Electronics Letters, 29(18), 1993, pp. 1621-1623