Authors:
WERKHOVEN C
GRANNEMAN E
LINDOW E
DEBLANK R
VERHAVERBEKE S
HEYNS MM
Citation: C. Werkhoven et al., CONTAMINATION CONTROL OF POLYSILICON GATES IN A VERTICAL REACTOR CLUSTER TOOL, Journal of the IES, 36(3), 1993, pp. 33-36
Citation: F. Martin et al., LPCVD SI3N4 GROWTH-RETARDATION ON SILICON NATIVE OXIDE COMPARED WITH INSITU HF VAPOR-DEGLAZED SILICON SUBSTRATES, Semiconductor science and technology, 6(11), 1991, pp. 1100-1102