Citation: S. Groudevazotova, WORKING CHARACTERISTICS OF 2 MAGNETRON SPUTTERING DEVICES BASED ON DIFFERENT UNBALANCED MAGNETIC SYSTEMS OF TYPE-II, Surface & coatings technology, 101(1-3), 1998, pp. 300-304
Citation: S. Groudevazotova, DOUBLE UNBALANCED MAGNETRON SPUTTERING SYSTEM USED FOR ION-ASSISTED THIN-FILM DEPOSITION, Vacuum, 51(2), 1998, pp. 119-126
Citation: S. Groudevazotova et al., SECONDARY-ELECTRON EMISSION COEFFICIENT OF C-H AND SI-C THIN-FILMS AND SOME RELATIONS TO THEIR MORPHOLOGY AND COMPOSITION, DIAMOND AND RELATED MATERIALS, 5(10), 1996, pp. 1087-1095
Authors:
KOURTEV J
GROUDEVAZOTOVA S
GARNEV I
ORLINOV V
Citation: J. Kourtev et al., UNBALANCED PLANAR MAGNETRON WITH CONTINUOUS CONTROL OF THE OPERATING MODE FROM TYPE-I TO TYPE-II, Vacuum, 47(11), 1996, pp. 1395-1397