Authors: WALKER R GURARY AI YUAN C ZAWADZKI P MOY K SALAGAJ T THOMPSON AG KROLL WJ STALL RA SCHUMAKER NE

Citation: R. Walker et al., NOVEL HIGH-TEMPERATURE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION VERTICAL ROTATING-DISK REACTOR WITH MULTIZONE HEATING FOR GAN AND RELATED MATERIALS, Materials science & engineering. B, Solid-state materials for advanced technology, 35(1-3), 1995, pp. 97-101

Authors: GURARY AI THOMPSON AG STALL RA KROLL WJ SCHUMAKER NE

Citation: Ai. Gurary et al., INVESTIGATION OF THE WAFER TEMPERATURE UNIFORMITY IN AN OMVPE VERTICAL ROTATING-DISK REACTOR, Journal of electronic materials, 24(11), 1995, pp. 1637-1640

Authors: GURARY AI TOMPA GS THOMPSON AG STALL RA ZAWADZKI PA SCHUMAKER NE

Citation: Ai. Gurary et al., THERMAL AND FLOW ISSUES IN THE DESIGN OF METALORGANIC CHEMICAL-VAPOR-DEPOSITION REACTORS, Journal of crystal growth, 145(1-4), 1994, pp. 642-649

Authors: TOMPA GS ZAWADZKI PA MOY K MCKEE M THOMPSON AG GURARY AI WOLAK E ESHERICK P BREILAND WG EVANS GH BULITKA N HENNESSY J MOORE CJL

Citation: Gs. Tompa et al., DESIGN AND OPERATING CHARACTERISTICS OF A METALORGANIC VAPOR-PHASE EPITAXY PRODUCTION SCALE, VERTICAL, HIGH-SPEED, ROTATING-DISK REACTOR, Journal of crystal growth, 145(1-4), 1994, pp. 655-661