Authors:
Hefyene, N
Cristoloveanu, S
Ghibaudo, G
Gentil, P
Moriyasu, Y
Morishita, T
Matsui, M
Yasujima, A
Citation: N. Hefyene et al., Adaptation of the pseudo-MOS transistor for the characterization of silicon-on-sapphire films, SOL ST ELEC, 44(10), 2000, pp. 1711-1715
Authors:
Bouillon, P
Gwoziecki, R
Skotnicki, T
Alieu, J
Gentil, P
Citation: P. Bouillon et al., Universal impurity ionization parameters in MIS C-V freeze-out characteristics and direct extraction of surface doping concentration, IEEE DEVICE, 47(4), 2000, pp. 871-877
Authors:
Gwoziecki, R
Skotnicki, T
Bouillon, P
Gentil, P
Citation: R. Gwoziecki et al., Optimization of V-th roll-off in MOSFET's with advanced channel architecture - Retrograde doping and pockets, IEEE DEVICE, 46(7), 1999, pp. 1551-1561