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Results:
1-9
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Results: 9
Authors:
Zianni, X
Velessiotis, D
Glezos, N
Trohidou, KN
Citation: X. Zianni et al., Application of the partial wave expansion method in 3-D low energy electron beam lithography simulation, MICROEL ENG, 57-8, 2001, pp. 297-302
Authors:
Raptis, I
Glezos, N
Valamontes, E
Zervas, E
Argitis, P
Citation: I. Raptis et al., Electron beam lithography simulation for high resolution and high-density patterns, VACUUM, 62(2-3), 2001, pp. 263-271
Authors:
Raptis, I
Nowotny, B
Glezos, N
Gentili, M
Meneghini, G
Citation: I. Raptis et al., Electron beam lithography simulation on homogeneous and multilayer substrates, JPN J A P 1, 39(2A), 2000, pp. 635-644
Authors:
Patsis, GP
Tserepi, A
Raptis, I
Glezos, N
Gogolides, E
Valamontes, ES
Citation: Gp. Patsis et al., Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation, J VAC SCI B, 18(6), 2000, pp. 3292-3296
Authors:
Glezos, N
Argitis, P
Velessiotis, D
Raptis, I
Hatzakis, M
Hudek, P
Kostic, I
Citation: N. Glezos et al., Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography, J VAC SCI B, 18(6), 2000, pp. 3431-3434
Authors:
Argitis, P
Glezos, N
Vasilopoulou, M
Raptis, I
Hatzakis, M
Everett, J
Meneghini, G
Palumbo, A
Ardito, M
Hudek, P
Kostic, I
Citation: P. Argitis et al., Aqueous base developable epoxy resist for high sensitivity electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 453-456
Authors:
Patsis, GP
Glezos, N
Raptis, I
Valamontes, ES
Citation: Gp. Patsis et al., Simulation of roughness in chemically amplified resists using percolation theory, J VAC SCI B, 17(6), 1999, pp. 3367-3370
Authors:
Patsis, GP
Glezos, N
Citation: Gp. Patsis et N. Glezos, Molecular dynamics simulation of gel formation and acid diffusion in negative tone chemically amplified resists, MICROEL ENG, 46(1-4), 1999, pp. 359-363
Authors:
Rosenbusch, A
Cui, Z
DiFabrizio, E
Gentili, M
Glezos, N
Meneghini, G
Nowotny, B
Patsis, G
Prewett, P
Raptis, I
Citation: A. Rosenbusch et al., Simulation of chemically amplified resist processes for 150 nm e-beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 379-382
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