Authors: Goeckner, MJ Felch, SB Fang, Z Oberhofer, A Chia, VKF Mount, GR Poulakos, M Keenan, WA

Citation: Mj. Goeckner et al., Profiling of ultrashallow junctions, J VAC SCI B, 18(1), 2000, pp. 472-476

Authors: Wang, ZH Cohen, SA Ruzic, DN Goeckner, MJ

Citation: Zh. Wang et al., Nitrogen atom energy distributions in a hollow-cathode planar sputtering magnetron, PHYS REV E, 61(2), 2000, pp. 1904-1911

Authors: Goeckner, MJ Felch, SB Fang, Z Lenoble, D Galvier, J Grouillet, A Yeap, GCF Bang, D Lin, MR

Citation: Mj. Goeckner et al., Plasma doping for shallow junctions, J VAC SCI B, 17(5), 1999, pp. 2290-2293

Authors: Goeckner, MJ Goeckner, NA

Citation: Mj. Goeckner et Na. Goeckner, Fourier-transform infrared measurements of CHF3/O-2 discharges in an electron cyclotron resonance reactor, J VAC SCI A, 17(5), 1999, pp. 2586-2592

Authors: Goeckner, MJ Felch, SB Weeman, J Mehta, S Reedholm, JS

Citation: Mj. Goeckner et al., Evaluation of charging damage test structures for ion implantation processes, J VAC SCI A, 17(4), 1999, pp. 1501-1509