Authors:
Goldstein, RV
Sarychev, ME
Shirabaikin, DB
Vladimirov, AS
Zhitnikov, YV
Citation: Rv. Goldstein et al., Modeling electromigration and the void nucleation in thin-film interconnects of integrated circuits, INT J FRACT, 109(1), 2001, pp. 91-121
Authors:
Alexandrov, SE
Goldstein, RV
Tchikanova, NN
Citation: Se. Alexandrov et al., Upper bound limit load solutions for a round welded bar with an internal axisymmetric crack, FATIG FRACT, 22(9), 1999, pp. 775-780
Citation: Se. Alexandrov et Rv. Goldstein, Exact analytical solution to a rigid/plastic problem with hardening and damage evolution, CR AC S IIB, 327(2-3), 1999, pp. 193-199