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Citation: Hc. Pfeiffer et al., PREVAIL e-beam stepper alpha tool, MICROEL ENG, 57-8, 2001, pp. 163-172

Authors: Dhaliwal, RS Enichen, WA Golladay, SD Gordon, MS Kendall, RA Lieberman, JE Pfeiffer, HC Pinckney, DJ Robinson, CF Rockrohr, JD Stickel, W Tressler, EV

Citation: Rs. Dhaliwal et al., Prevail - Electron projection technology approach for next-generation lithography, IBM J RES, 45(5), 2001, pp. 615-638

Authors: Golladay, SD Pfeiffer, HC Rockrohr, JD Stickel, W

Citation: Sd. Golladay et al., PREVAIL Alpha system: Status and design considerations, J VAC SCI B, 18(6), 2000, pp. 3072-3078

Authors: Gordon, MS Enichen, WA Golladay, SD Pfeiffer, HC Robinson, CF Stickel, W

Citation: Ms. Gordon et al., PREVAIL: Dynamic correction of aberrations, J VAC SCI B, 18(6), 2000, pp. 3079-3083

Authors: Pfeiffer, HC Dhaliwal, RS Golladay, SD Doran, SK Gordon, MS Groves, TR Kendall, RA Lieberman, JE Petric, PF Pinckney, DJ Quickle, RJ Robinson, CF Rockrohr, JD Senesi, JJ Stickel, W Tressler, EV Tanimoto, A Yamaguchi, T Okamoto, K Suzuki, K Okino, T Kawata, S Morita, K Suziki, SC Shimizu, H Kojima, S Varnell, G Novak, WT Stumbo, DP Sogard, M

Citation: Hc. Pfeiffer et al., Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J VAC SCI B, 17(6), 1999, pp. 2840-2846

Authors: Golladay, SD Kendall, RA Doran, SK

Citation: Sd. Golladay et al., High emittance source for the PREVAIL projection lithography system, J VAC SCI B, 17(6), 1999, pp. 2856-2859