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Citation: Jt. Hastings et al., Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling, J VAC SCI B, 18(6), 2000, pp. 3268-3271

Authors: Goodberlet, JG Dunn, BL

Citation: Jg. Goodberlet et Bl. Dunn, Deep-ultraviolet contact photolithography, MICROEL ENG, 53(1-4), 2000, pp. 95-99

Authors: Hastings, JT Zhang, F Goodberlet, JG Smith, H

Citation: Jt. Hastings et al., Improved pattern-placement accuracy in E-beam lithography via sparse-sample spatial-phase locking, MICROEL ENG, 53(1-4), 2000, pp. 361-364

Authors: Goodberlet, JG

Citation: Jg. Goodberlet, Patterning 100 nm features using deep-ultraviolet contact photolithography, APPL PHYS L, 76(6), 2000, pp. 667-669

Authors: Goodberlet, JG

Citation: Jg. Goodberlet, A very-high-density scintillation-data-storage device, MICROEL ENG, 46(1-4), 1999, pp. 145-148