Authors:
Grosse, P
Basset, G
Calvat, C
Couchaud, M
Faure, C
Ferrand, B
Grange, Y
Anikin, M
Bluet, JM
Chourou, K
Madar, R
Citation: P. Grosse et al., Influence of reactor cleanness and process conditions on the growth by PVTand the purity of 4H and 6H SiC crystals, MAT SCI E B, 61-2, 1999, pp. 58-62