AAAAAA
Results:
1-7
|
Results: 7
Authors:
Gusev, EP
Cartier, E
Buchanan, DA
Gribelyuk, M
Copel, M
Okorn-Schmidt, H
D'Emic, C
Citation: Ep. Gusev et al., Ultrathin high-K metal oxides on silicon: processing, characterization andintegration issues, MICROEL ENG, 59(1-4), 2001, pp. 341-349
Authors:
Callegari, A
Cartier, E
Gribelyuk, M
Okorn-Schmidt, HF
Zabel, T
Citation: A. Callegari et al., Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films, J APPL PHYS, 90(12), 2001, pp. 6466-6475
Authors:
Ma, TZ
Campbell, SA
Smith, R
Hoilien, N
He, BY
Gladfelter, WL
Hobbs, C
Buchanan, D
Taylor, C
Gribelyuk, M
Tiner, M
Coppel, M
Lee, JJ
Citation: Tz. Ma et al., Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates, IEEE DEVICE, 48(10), 2001, pp. 2348-2356
Authors:
Smith, RC
Hoilien, N
Taylor, CJ
Ma, TZ
Campbell, SA
Roberts, JT
Copel, M
Buchanan, DA
Gribelyuk, M
Gladfelter, WL
Citation: Rc. Smith et al., Low temperature chemical vapor deposition of ZrO2 on Si(100) using anhydrous zirconium(IV) nitrate, J ELCHEM SO, 147(9), 2000, pp. 3472-3476
Authors:
Copel, M
Gribelyuk, M
Gusev, E
Citation: M. Copel et al., Structure and stability of ultrathin zirconium oxide layers on Si(001), APPL PHYS L, 76(4), 2000, pp. 436-438
Authors:
Schwander, P
Rau, WD
Kisielowski, C
Gribelyuk, M
Ourmazd, A
Citation: P. Schwander et al., Defect processes in semiconductors studied at the atomic level by transmission electron microscopy, SEM SEMIMET, 51, 1999, pp. 225-259
Authors:
Kapila, D
Hattangady, S
Douglas, M
Kraft, R
Gribelyuk, M
Citation: D. Kapila et al., Modeling and optimization of oxynitride gate dielectrics formation by remote plasma nitridation of silicon dioxide, J ELCHEM SO, 146(3), 1999, pp. 1111-1116
Risultati:
1-7
|