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Freund, HJ
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Torres, CMS
Pfeiffer, K
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Grutzner, G
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Authors:
Gaboriau, F
Peignon, MC
Barreau, A
Turban, G
Cardinaud, C
Pfeiffer, K
Bleidiessel, G
Grutzner, G
Citation: F. Gaboriau et al., High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography, MICROEL ENG, 53(1-4), 2000, pp. 501-505