Authors:
ITANI T
YOSHINO H
HASHIMOTO S
YAMANA M
SAMOTO N
KASAMA K
Citation: T. Itani et al., A STUDY OF ACID DIFFUSION IN CHEMICALLY AMPLIFIED DEEP-ULTRAVIOLET RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4226-4228