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Results: 1-25 | 26-37 |
Results: 26-37/37
INFLUENCE OF PHOSPHORUS ADDITION ON DIAMOND CVD
Authors: BOHR S HAUBNER R LUX B
Citation: S. Bohr et al., INFLUENCE OF PHOSPHORUS ADDITION ON DIAMOND CVD, DIAMOND AND RELATED MATERIALS, 4(2), 1995, pp. 133-144
PRETREATMENT OF SILICON SUBSTRATES FOR CVD DIAMOND DEPOSITION STUDIEDBY ATOMIC-FORCE MICROSCOPY
Authors: FRIEDBACHER G BOUVERESSE E FUCHS G GRASSERBAUER M SCHWARZBACH D HAUBNER R LUX B
Citation: G. Friedbacher et al., PRETREATMENT OF SILICON SUBSTRATES FOR CVD DIAMOND DEPOSITION STUDIEDBY ATOMIC-FORCE MICROSCOPY, Applied surface science, 84(2), 1995, pp. 133-143
THE FORMATION OF SILICON-CARBIDE FILMS FROM DISILANE DERIVATIVES
Authors: HENGGE E ZECHMANN A HOFER F POLT P LUX B DANZINGER M HAUBNER R
Citation: E. Hengge et al., THE FORMATION OF SILICON-CARBIDE FILMS FROM DISILANE DERIVATIVES, Advanced materials, 6(7-8), 1994, pp. 584-587
CHARACTERIZATION OF TANTALUM IMPURITIES IN HOT-FILAMENT DIAMOND LAYERS
Authors: GRIESSER M STINGEDER G GRASSERBAUER M BAUMANN H LINK F WURZINGER P LUX H HAUBNER R LUX B
Citation: M. Griesser et al., CHARACTERIZATION OF TANTALUM IMPURITIES IN HOT-FILAMENT DIAMOND LAYERS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 638-644
CHARACTERIZATION OF DIAMOND COATINGS WITH TRANSMISSION ELECTRON-MICROSCOPY
Authors: JOKSCH M WURZINGER P PONGRATZ P HAUBNER R LUX B
Citation: M. Joksch et al., CHARACTERIZATION OF DIAMOND COATINGS WITH TRANSMISSION ELECTRON-MICROSCOPY, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 681-687
INTERNAL-STRESSES IN CVD DIAMOND LAYERS
Authors: SCHWARZBACH D HAUBNER R LUX B
Citation: D. Schwarzbach et al., INTERNAL-STRESSES IN CVD DIAMOND LAYERS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 757-764
INFLUENCES OF WC-CO HARD METAL-SUBSTRATE PRETREATMENTS WITH BORON ANDSILICON ON LOW-PRESSURE DIAMOND DEPOSITION
Authors: KUBELKA S HAUBNER R LUX B STEINER R STINGEDER G GRASSERBAUER M
Citation: S. Kubelka et al., INFLUENCES OF WC-CO HARD METAL-SUBSTRATE PRETREATMENTS WITH BORON ANDSILICON ON LOW-PRESSURE DIAMOND DEPOSITION, DIAMOND AND RELATED MATERIALS, 3(11-12), 1994, pp. 1360-1369
DIAMOND SUBSTRATE INTERACTIONS AND THE ADHESION OF DIAMOND COATINGS
Authors: LUX B HAUBNER R
Citation: B. Lux et R. Haubner, DIAMOND SUBSTRATE INTERACTIONS AND THE ADHESION OF DIAMOND COATINGS, Pure and applied chemistry, 66(9), 1994, pp. 1783-1788
CATHODOLUMINESCENCE (CL) AND CL SPECTRA OF MICROWAVE PLASMA-ENHANCED CVD DIAMOND
Authors: PONAHLO J HAUBNER R LUX B
Citation: J. Ponahlo et al., CATHODOLUMINESCENCE (CL) AND CL SPECTRA OF MICROWAVE PLASMA-ENHANCED CVD DIAMOND, Mikrochimica acta, 116(1-3), 1994, pp. 143-156
HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION OF DIAMOND ON SIALON AT PRESSURES UP TO 500-TORR
Authors: BRUNSTEINER R HAUBNER R LUX B
Citation: R. Brunsteiner et al., HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION OF DIAMOND ON SIALON AT PRESSURES UP TO 500-TORR, DIAMOND AND RELATED MATERIALS, 2(9), 1993, pp. 1263-1270
DIAMOND GROWTH BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION - STATE-OF-THE-ART
Authors: HAUBNER R LUX B
Citation: R. Haubner et B. Lux, DIAMOND GROWTH BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION - STATE-OF-THE-ART, DIAMOND AND RELATED MATERIALS, 2(9), 1993, pp. 1277-1294
DIAMOND DEPOSITION ON CHROMIUM, COBALT AND NICKEL SUBSTRATES BY MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION
Authors: HAUBNER R LINDLBAUER A LUX B
Citation: R. Haubner et al., DIAMOND DEPOSITION ON CHROMIUM, COBALT AND NICKEL SUBSTRATES BY MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION, DIAMOND AND RELATED MATERIALS, 2(12), 1993, pp. 1505-1515
Risultati: 1-25 | 26-37 |