Authors: BASHIR R NEUDECK GW HAW Y KVAM EP DENTON JP

Citation: R. Bashir et al., CHARACTERIZATION OF SIDEWALL DEFECTS IN SELECTIVE EPITAXIAL-GROWTH OFSILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 923-927

Authors: BASHIR R NEUDECK GW HAW Y KVAM EP

Citation: R. Bashir et al., CHARACTERIZATION AND MODELING OF SIDEWALL DEFECTS IN SELECTIVE EPITAXIAL-GROWTH OF SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 928-935