Authors: HEBB JP JENSEN KF THOMAS J

Citation: Jp. Hebb et al., THE EFFECT OF SURFACE-ROUGHNESS ON THE RADIATIVE PROPERTIES OF PATTERNED SILICON-WAFERS, IEEE transactions on semiconductor manufacturing, 11(4), 1998, pp. 607-614

Authors: HEBB JP JENSEN KF

Citation: Jp. Hebb et Kf. Jensen, THE EFFECT OF PATTERNS ON THERMAL-STRESS DURING RAPID THERMAL-PROCESSING OF SILICON-WAFERS, IEEE transactions on semiconductor manufacturing, 11(1), 1998, pp. 99-107

Authors: MACBRIDE DM MALONE CG HEBB JP CRAVALHO EG

Citation: Dm. Macbride et al., EFFECT OF TEMPERATURE-VARIATION ON FT-IR SPECTROMETER STABILITY, Applied spectroscopy, 51(1), 1997, pp. 43-50

Authors: MERCHANT TP COLE JV KNUTSON KL HEBB JP JENSEN KF

Citation: Tp. Merchant et al., A SYSTEMATIC-APPROACH TO SIMULATING RAPID THERMAL-PROCESSING SYSTEMS, Journal of the Electrochemical Society, 143(6), 1996, pp. 2035-2043

Authors: HEBB JP JENSEN KF

Citation: Jp. Hebb et Kf. Jensen, THE EFFECT OF MULTILAYER PATTERNS ON TEMPERATURE UNIFORMITY DURING RAPID THERMAL-PROCESSING, Journal of the Electrochemical Society, 143(3), 1996, pp. 1142-1151

Authors: HEBB JP CRAVALHO EG FLIK MI

Citation: Jp. Hebb et al., THERMAL-RADIATION ABSORPTION IN DOPED SEMICONDUCTORS DUE TO DIRECT INTERSUBBAND TRANSITIONS, Journal of heat transfer, 117(4), 1995, pp. 948-954