Authors: SMITH HI SCHATTENBURG ML HECTOR SD FERRERA J MOON EE YANG IY BURKHARDT M

Citation: Hi. Smith et al., X-RAY NANOLITHOGRAPHY - EXTENSION TO THE LIMITS OF THE LITHOGRAPHIC PROCESS, Microelectronic engineering, 32(1-4), 1996, pp. 143-158

Authors: HECTOR SD WONG VV SMITH HI MCCORD MA RHEE KW

Citation: Sd. Hector et al., PRINTABILITY OF SUB-150 NM FEATURES IN X-RAY-LITHOGRAPHY - THEORY ANDEXPERIMENTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3965-3969

Authors: GUO JZY CELLER GK MALDONADO JR HECTOR SD

Citation: Jzy. Guo et al., WAVELENGTH DEPENDENCE OF EXPOSURE WINDOW AND RESIST PROFILE IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 4044-4050

Authors: HECTOR SD SMITH HI GUPTA N SCHATTENBURG ML

Citation: Sd. Hector et al., OPTIMIZING SYNCHROTRON-BASED X-RAY-LITHOGRAPHY FOR 0.1 MU-M LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 203-206

Authors: GUPTA N HECTOR SD RHEE KW SMITH HI

Citation: N. Gupta et al., FABRICATION OF 100-NM T-GATES FOR MONOLITHIC MICROWAVE INTEGRATED-CIRCUITS USING X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2625-2628

Authors: HECTOR SD SMITH HI SCHATTENBURG ML

Citation: Sd. Hector et al., SIMULTANEOUS-OPTIMIZATION OF SPECTRUM, SPATIAL COHERENCE, GAP, FEATURE BIAS, AND ABSORBER THICKNESS IN SYNCHROTRON-BASED X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2981-2985