Authors: EHLERT A KERSTAN M LUNDT H HUBER A HELMREICH D GEILER HD KARGE H WAGNER M

Citation: A. Ehlert et al., SELECTED APPLICATIONS OF PHOTOTHERMAL AND PHOTOLUMINESCENCE HETERODYNE TECHNIQUES FOR PROCESS-CONTROL IN SILICON-WAFER MANUFACTURING, Optical engineering, 36(2), 1997, pp. 446-458

Authors: GEILER HD KARGE H WAGNER M EHLERT A KERSTAN M HELMREICH D

Citation: Hd. Geiler et al., ANALYSIS OF SUBSURFACE DAMAGE IN SILICON BY A COMBINED PHOTOTHERMAL AND PHOTOLUMINESCENCE HETERODYNE MEASUREMENT, Journal of applied physics, 81(11), 1997, pp. 7548-7551

Authors: GEILER HD KARGE H WAGNER M EHLERT A KERSTAN M HELMREICH D

Citation: Hd. Geiler et al., ANALYSIS OF SUBSURFACE DAMAGE IN SILICON BY PHOTOLUMINESCENCE AND PHOTOTHERMAL HETERODYNE METHODS, Progress in Natural Science, 6, 1996, pp. 498-502