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Results: 1-25/44
Authors:
ALEXANDROV SE
HITCHMAN ML
KOVALGIN AY
Citation: Se. Alexandrov et al., REMOTE PLASMA-ENHANCED CVD OF SILICON-NITRIDE FILMS - EFFECTS OF DILUTING NITROGEN WITH ARGON - PART II - EFFECT OF NITROGEN PLASMA PARAMETERS ON LAYER CHARACTERISTICS, Advanced materials for optics and electronics, 8(1), 1998, pp. 23-29
Authors:
HITCHMAN ML
Citation: Ml. Hitchman, WERE THE TOPS, CHEMICAL VAPOR DEPOSITION, 4(1), 1998, pp. 5-5
Authors:
HITCHMAN ML
Citation: Ml. Hitchman, ESSAY - UN-CONGRES-FORMIDABLE, CHEMICAL VAPOR DEPOSITION, 4(1), 1998, pp. 6-8
Authors:
SIMMONDS MC
HITCHMAN ML
KHEYRANDISH H
COLLIGON JS
CADE NJ
IREDALE PJ
Citation: Mc. Simmonds et al., THIN SPUTTERED PLATINUM FILMS ON POROUS MEMBRANES AS WORKING ELECTRODES IN GAS SENSORS, Electrochimica acta, 43(21-22), 1998, pp. 3285-3291
Authors:
SIMMONDS MC
KHEYRANDISH H
COLLIGON JS
HITCHMAN ML
CADE N
IREDALE J
Citation: Mc. Simmonds et al., THE OBSERVATION OF A THRESHOLD IN THE DE-ALLOYING OF SPUTTER-DEPOSITED PTXAL1-X ALLOY THIN-FILMS, Corrosion science, 40(1), 1998, pp. 43-48
Authors:
MCDONALD J
MCINTYRE A
HITCHMAN ML
LITTLEJOHN D
Citation: J. Mcdonald et al., DETERMINATION OF ANILINE IN HYDROFLUORIC-ACID SOLUTIONS BY NIR SPECTROMETRY WITH A FIBEROPTIC INTERFACE, Applied spectroscopy, 52(6), 1998, pp. 908-911
Authors:
DALRYMPLE IM
HITCHMAN ML
PRICE D
MILLINGTON JP
Citation: Im. Dalrymple et al., IN-SITU MONITORING OF PEROXODISULFATE ANION PRODUCTION, Electroanalysis, 9(2), 1997, pp. 130-134
Authors:
YUSTA FJ
HITCHMAN ML
SHAMLIAN SH
Citation: Fj. Yusta et al., CVD-PREPARATION AND CHARACTERIZATION OF TIN DIOXIDE FILMS FOR ELECTROCHEMICAL APPLICATIONS, Journal of materials chemistry, 7(8), 1997, pp. 1421-1427
Authors:
ALEXANDROV SE
HITCHMAN ML
Citation: Se. Alexandrov et Ml. Hitchman, REMOTE PLASMA-ENHANCED CVD OF FLUORINATED SILICON-NITRIDE FILMS, CHEMICAL VAPOR DEPOSITION, 3(3), 1997, pp. 111-117
Authors:
HABERMEIER HU
HITCHMAN ML
Citation: Hu. Habermeier et Ml. Hitchman, UNTITLED - PREFACE, Journal of alloys and compounds, 251(1-2), 1997, pp. 11-12
Authors:
HITCHMAN ML
SHAMLIAN SH
CONDORELLI GG
CHABERTROCABOIS F
Citation: Ml. Hitchman et al., A STUDY BY FTIR AND MASS-SPECTROSCOPY OF THE DECOMPOSITION OF PRECURSORS FOR THE MOCVD OF HIGH-TEMPERATURE SUPERCONDUCTORS, Journal of alloys and compounds, 251(1-2), 1997, pp. 297-302
Authors:
ROSS NC
SPACKMAN RA
HITCHMAN ML
WHITE PC
Citation: Nc. Ross et al., AN INVESTIGATION OF THE ELECTROCHEMICAL REDUCTION OF PENTACHLOROPHENOL WITH ANALYSIS BY HPLC, Journal of Applied Electrochemistry, 27(1), 1997, pp. 51-57
Authors:
HITCHMAN ML
CADE NJ
GIBBS TK
HEDLEY NJM
Citation: Ml. Hitchman et al., STUDY OF THE FACTORS AFFECTING MASS-TRANSPORT IN ELECTROCHEMICAL GAS SENSORS, Analyst, 122(11), 1997, pp. 1411-1417
Authors:
TROJANOWICZ M
HITCHMAN ML
Citation: M. Trojanowicz et Ml. Hitchman, A POTENTIOMETRIC POLYPYRROLE-BASED GLUCOSE BIOSENSOR, Electroanalysis, 8(3), 1996, pp. 263-266
Authors:
HITCHMAN ML
SPACKMAN RA
AGRA C
Citation: Ml. Hitchman et al., PHOTOELECTROCHEMICAL STUDY OF TITANIUM-DIOXIDE FILMS PREPARED BY ANODIZATION OF TITANIUM METAL IN SULFURIC-ACID, Journal of the Chemical Society. Faraday transactions, 92(20), 1996, pp. 4049-4052
Authors:
MARKS TJ
HITCHMAN ML
Citation: Tj. Marks et Ml. Hitchman, HIGH-TEMPERATURE SUPERCONDUCTORS AND RELATED TOPICS, CHEMICAL VAPOR DEPOSITION, 2(6), 1996, pp. 293
Authors:
ROCABOIS P
HITCHMAN ML
SHAMLIAN SH
Citation: P. Rocabois et al., CONSIDERATIONS OF THE PRODUCTION OF C-60 THIN-FILMS BY PECVD, COMBUSTION, OR PYROLYSIS, CHEMICAL VAPOR DEPOSITION, 2(2), 1996, pp. 57-68
Authors:
HITCHMAN ML
GILLILAND DD
Citation: Ml. Hitchman et Dd. Gilliland, STUDIES OF MOCVD FOR HIGH T-C THIN-FILMS, Ceramics international, 22(6), 1996, pp. 515-519
Authors:
TROJANOWICZ M
HITCHMAN ML
Citation: M. Trojanowicz et Ml. Hitchman, DETERMINATION OF PESTICIDES USING ELECTROCHEMICAL BIOSENSORS, TrAC. Trends in analytical chemistry, 15(1), 1996, pp. 38-45
Authors:
RALPH TR
HITCHMAN ML
MILLINGTON JP
WALSH FC
Citation: Tr. Ralph et al., MASS-TRANSPORT IN AN ELECTROCHEMICAL LABORATORY FILTERPRESS REACTOR AND ITS ENHANCEMENT BY TURBULENCE PROMOTERS, Electrochimica acta, 41(4), 1996, pp. 591-603
Authors:
KOVALGIN AY
CHABERTROCABOIS F
HITCHMAN ML
SHAMLIAN SH
ALEXANDROV SE
Citation: Ay. Kovalgin et al., A STUDY BY IN-SITU FTIR SPECTROSCOPY OF THE DECOMPOSITION OF PRECURSORS FOR THE MOCVD OF HIGH-TEMPERATURE SUPERCONDUCTORS, Journal de physique. IV, 5(C5), 1995, pp. 357-364
Authors:
KOVALGIN AY
CHABERTROCABOIS F
HITCHMAN ML
SHAMLIAN SH
ALEXANDROV SE
Citation: Ay. Kovalgin et al., A STUDY BY IN-SITU FTIR SPECTROSCOPY OF THE DECOMPOSITION OF PRECURSORS FOR THE MOCVD OF HIGH-TEMPERATURE SUPERCONDUCTORS, Journal de physique. IV, 5(C5), 1995, pp. 357-364
Authors:
NASH JAP
BARNES JC
COLEHAMILTON DJ
RICHARDS BC
COOK SL
HITCHMAN ML
Citation: Jap. Nash et al., THE X-RAY CRYSTAL AND MOLECULAR-STRUCTURE OF [BA(TDFND)(2).TETRAGLYME], THE FIRST MOLTEN BARIUM PRECURSOR FOR MOCVD APPLICATIONS, Advanced materials for optics and electronics, 5(1), 1995, pp. 1-10
Authors:
ALEXANDROV SE
HITCHMAN ML
SHAMLIAN SH
Citation: Se. Alexandrov et al., REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SILICON-NITRIDE FILMS - THE EFFECT OF DILUTING NITROGEN WITH HELIUM, Journal of materials chemistry, 5(3), 1995, pp. 457-460
Authors:
HITCHMAN ML
SHAMLIAN SH
GILLILAND DD
COLEHAMILTON DJ
NASH JAP
THOMPSON SC
COOK SL
Citation: Ml. Hitchman et al., REPRODUCIBLE MOCVD OF BARIUM FLUORIDE - STUDIES OF THE EFFECT OF THE DEGREE OF PRECURSOR CRYSTALLINITY AND PURITY, Journal of materials chemistry, 5(1), 1995, pp. 47-52