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Results: 1-9 |
Results: 9
MODELED TUNNEL CURRENTS FOR HIGH DIELECTRIC-CONSTANT DIELECTRICS
Authors: VOGEL EM AHMED KZ HORNUNG B HENSON WK MCLARTY PK LUCOVSKY G HAUSER JR WORTMAN JJ
Citation: Em. Vogel et al., MODELED TUNNEL CURRENTS FOR HIGH DIELECTRIC-CONSTANT DIELECTRICS, I.E.E.E. transactions on electron devices, 45(6), 1998, pp. 1350-1355
VETERINARIAN ASPECTS OF OSTRICH FARMING
Authors: KOSTERS J HORNUNG B KORBEL R
Citation: J. Kosters et al., VETERINARIAN ASPECTS OF OSTRICH FARMING, DTW. Deutsche tierarztliche Wochenschrift, 103(3), 1996, pp. 100-104
SYSTEM-INDEPENDENT SONOGRAPHY IN MAXILLOF ACIAL SURGERY
Authors: SADER R ZEILHOFER HF DEPPE H HORCH HH NUBER B HORNUNG B
Citation: R. Sader et al., SYSTEM-INDEPENDENT SONOGRAPHY IN MAXILLOF ACIAL SURGERY, Ultraschall in der Medizin, 16(6), 1995, pp. 269-274
FORMATION OF SI-SIO2 STACKED-GATE STRUCTURES BY PLASMA-ASSISTED AND RAPID-THERMAL PROCESSING - IMPROVED DEVICE PERFORMANCE THROUGH PROCESS INTEGRATION
Authors: LUCOVSKY G WORTMAN JJ YASUDA T XU XL MISRA V HATTANGADY SV MA Y HORNUNG B
Citation: G. Lucovsky et al., FORMATION OF SI-SIO2 STACKED-GATE STRUCTURES BY PLASMA-ASSISTED AND RAPID-THERMAL PROCESSING - IMPROVED DEVICE PERFORMANCE THROUGH PROCESS INTEGRATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2839-2847
INVESTIGATION OF ROUGHENED SILICON SURFACES USING FRACTAL ANALYSIS .2. CHEMICAL ETCHING, RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION, AND THERMAL-OXIDATION
Authors: SPANOS L LIU Q IRENE EA ZETTLER T HORNUNG B WORTMAN JJ
Citation: L. Spanos et al., INVESTIGATION OF ROUGHENED SILICON SURFACES USING FRACTAL ANALYSIS .2. CHEMICAL ETCHING, RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION, AND THERMAL-OXIDATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(5), 1994, pp. 2653-2661
LOW-TEMPERATURE PLASMA-ASSISTED OXIDATION COMBINED WITH IN-SITU RAPIDTHERMAL OXIDE DEPOSITION FOR STACKED-GATE SI-SIO2 HETEROSTRUCTURES - INTEGRATED PROCESSING AND DEVICE STUDIES
Authors: MISRA V HATTANGADY SV YASUDA T XU XL HORNUNG B LUCOVSKY G WORTMAN JJ
Citation: V. Misra et al., LOW-TEMPERATURE PLASMA-ASSISTED OXIDATION COMBINED WITH IN-SITU RAPIDTHERMAL OXIDE DEPOSITION FOR STACKED-GATE SI-SIO2 HETEROSTRUCTURES - INTEGRATED PROCESSING AND DEVICE STUDIES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1371-1379
INTEGRATED PROCESSING OF STACKED-GATE HETEROSTRUCTURES - PLASMA-ASSISTED LOW-TEMPERATURE PROCESSING COMBINED WITH RAPID THERMAL HIGH-TEMPERATURE PROCESSING
Authors: MISRA V HATTANGADY S XU XL WATKINS MJ HORNUNG B LUCOVSKY G WORTMAN JJ EMMERICHS U MEYER C LEO K KURZ H
Citation: V. Misra et al., INTEGRATED PROCESSING OF STACKED-GATE HETEROSTRUCTURES - PLASMA-ASSISTED LOW-TEMPERATURE PROCESSING COMBINED WITH RAPID THERMAL HIGH-TEMPERATURE PROCESSING, Microelectronic engineering, 25(2-4), 1994, pp. 209-214
LOW-TEMPERATURE PLASMA-ASSISTED OXIDATION OF SI - A NEW APPROACH FOR CREATION OF DEVICE-QUALITY SI-SIO2 INTERFACES WITH DEPOSITED DIELECTRICS FOR APPLICATIONS IN SI MOSFET TECHNOLOGIES
Authors: LUCOVSKY G YASUDA T MA Y HATTANGADY S MISRA V XU XL HORNUNG B WORTMAN JJ
Citation: G. Lucovsky et al., LOW-TEMPERATURE PLASMA-ASSISTED OXIDATION OF SI - A NEW APPROACH FOR CREATION OF DEVICE-QUALITY SI-SIO2 INTERFACES WITH DEPOSITED DIELECTRICS FOR APPLICATIONS IN SI MOSFET TECHNOLOGIES, Journal of non-crystalline solids, 179, 1994, pp. 354-366
LAURIC ACID INHIBITS THE MATURATION OF VESICULAR STOMATITIS-VIRUS
Authors: HORNUNG B AMTMANN E SAUER G
Citation: B. Hornung et al., LAURIC ACID INHIBITS THE MATURATION OF VESICULAR STOMATITIS-VIRUS, Journal of General Virology, 75, 1994, pp. 353-361
Risultati: 1-9 |