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Results: 1-10 |
Results: 10
RESIST DESIGN CONCEPTS FOR 193 NM LITHOGRAPHY - OPPORTUNITIES FOR INNOVATION AND INVENTION
Authors: REICHMANIS E NALAMASU O HOULIHAN FM WALLOW TI TIMKO AG CIRELLI R DABBAGH G HUTTON RS NOVEMBRE AE SMITH BW
Citation: E. Reichmanis et al., RESIST DESIGN CONCEPTS FOR 193 NM LITHOGRAPHY - OPPORTUNITIES FOR INNOVATION AND INVENTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2528-2533
A RETROSPECTIVE ON 2-NITROBENZYL SULFONATE PHOTOACID GENERATORS
Authors: HOULIHAN FM NALAMASU O KOMETANI JM REICHMANIS E
Citation: Fm. Houlihan et al., A RETROSPECTIVE ON 2-NITROBENZYL SULFONATE PHOTOACID GENERATORS, Journal of imaging science and technology, 41(1), 1997, pp. 35-40
REVOLUTIONARY AND EVOLUTIONARY RESIST DESIGN CONCEPTS FOR 193-NM LITHOGRAPHY
Authors: NALAMASU O WALLOW TI REICHMANIS E NOVEMBRE AE HOULIHAN FM DABBAGH G MIXON DA HUTTON RS TIMKO AG WOOD OR CIRELLI RA
Citation: O. Nalamasu et al., REVOLUTIONARY AND EVOLUTIONARY RESIST DESIGN CONCEPTS FOR 193-NM LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 133-136
SYNTHESIS OF CYCLOOLEFIN MALEIC-ANHYDRIDE ALTERNATING COPOLYMERS FOR 193 NM IMAGING
Authors: HOULIHAN FM WALLOW TI NALAMASU O REICHMANIS E
Citation: Fm. Houlihan et al., SYNTHESIS OF CYCLOOLEFIN MALEIC-ANHYDRIDE ALTERNATING COPOLYMERS FOR 193 NM IMAGING, Macromolecules, 30(21), 1997, pp. 6517-6524
SELECTIVE ELECTROLESS NICKEL DEPOSITION ON PATTERNED PHOSPHONATE AND CARBOXYLATE POLYMER-FILMS
Authors: SCHILLING ML KATZ HE HOULIHAN FM STEIN SM HUTTON RS TAYLOR GN
Citation: Ml. Schilling et al., SELECTIVE ELECTROLESS NICKEL DEPOSITION ON PATTERNED PHOSPHONATE AND CARBOXYLATE POLYMER-FILMS, Journal of the Electrochemical Society, 143(2), 1996, pp. 691-695
TITANIUM CLUSTER POLYMERS AS REACTIVE ION ETCH BARRIERS
Authors: KATZ HE SCHILLING ML STEIN SM HOULIHAN FM HUTTON RS TAYLOR GN
Citation: He. Katz et al., TITANIUM CLUSTER POLYMERS AS REACTIVE ION ETCH BARRIERS, Chemistry of materials, 7(8), 1995, pp. 1534-1538
PHOTOINDUCED DOPING AND PHOTOLITHOGRAPHY OF METHYL-SUBSTITUTED POLYANILINE
Authors: VENUGOPAL G QUAN X JOHNSON GE HOULIHAN FM CHIN E NALAMASU O
Citation: G. Venugopal et al., PHOTOINDUCED DOPING AND PHOTOLITHOGRAPHY OF METHYL-SUBSTITUTED POLYANILINE, Chemistry of materials, 7(2), 1995, pp. 271-276
PHOTOGENERATED ACID-CATALYZED FORMATION OF PHOSPHONIC PHOSPHORIC-ACIDS BY DEPROTECTION OF ESTERS IN POLYMER-FILMS
Authors: SCHILLING ML KATZ HE HOULIHAN FM KOMETANI JM STEIN SM NALAMASU O
Citation: Ml. Schilling et al., PHOTOGENERATED ACID-CATALYZED FORMATION OF PHOSPHONIC PHOSPHORIC-ACIDS BY DEPROTECTION OF ESTERS IN POLYMER-FILMS, Macromolecules, 28(1), 1995, pp. 110-115
GLASS-TRANSITION TEMPERATURE (T(G)) VERSUS FRACTIONAL CONVERSION FOR A LINEAR THERMOSETTING POLYAMIC ACID ESTER POLYIMIDE SYSTEM
Authors: VENDITTI RA GILLHAM JK CHIN E HOULIHAN FM
Citation: Ra. Venditti et al., GLASS-TRANSITION TEMPERATURE (T(G)) VERSUS FRACTIONAL CONVERSION FOR A LINEAR THERMOSETTING POLYAMIC ACID ESTER POLYIMIDE SYSTEM, Journal of applied polymer science, 53(4), 1994, pp. 455-461
A NOVEL-APPROACH TO INDUCING AQUEOUS BASE SOLUBILITY IN SUBSTITUTED STYRENE SULFONE POLYMERS
Authors: KOMETANI JM GALVIN ME HEFFNER SA HOULIHAN FM NALAMASU O CHIN E REICHMANIS E
Citation: Jm. Kometani et al., A NOVEL-APPROACH TO INDUCING AQUEOUS BASE SOLUBILITY IN SUBSTITUTED STYRENE SULFONE POLYMERS, Macromolecules, 26(9), 1993, pp. 2165-2170
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