Authors: HSU DSY GRAY HF

Citation: Dsy. Hsu et Hf. Gray, VERTICAL THIN-FILM-EDGE FIELD EMITTERS - FABRICATION BY CHEMICAL BEAMDEPOSITION, IMAGING OF CATHODOLUMINESCENCE AND CHARACTERIZATION OF EMISSION, Thin solid films, 286(1-2), 1996, pp. 92-97

Authors: POTOCHNIK SJ PEHRSSON PE HSU DSY CALVERT JM

Citation: Sj. Potochnik et al., SELECTIVE COPPER CHEMICAL-VAPOR-DEPOSITION USING PD-ACTIVATED ORGANOSILANE FILMS, Langmuir, 11(6), 1995, pp. 1841-1845

Authors: HSU DSY TROILO LM TURNER NH PIERSON KW

Citation: Dsy. Hsu et al., SELECTIVE-AREA PLATINUM SILICIDE FILM DEPOSITION USING A MOLECULAR PRECURSOR CHEMICAL BEAM SOURCE, Thin solid films, 269(1-2), 1995, pp. 21-28

Authors: HSU DSY

Citation: Dsy. Hsu, 10TH MICROMETER TRENCH FABRICATION BY APERTURE NARROWING OF 0.6-MU-M STARTING MASK STRUCTURES USING CHEMICAL-BEAM DEPOSITION AND ION-BEAM REDEPOSITION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(5), 1994, pp. 3048-3053

Authors: FU SS MALAFSKY GP HSU DSY

Citation: Ss. Fu et al., CO ADSORPTION ON ION-BOMBARDED NI(111) - CHARACTERIZATION BY PHOTOEMISSION FROM ADSORBED XENON, Surface science, 297(2), 1993, pp. 167-174

Authors: HSU DSY GRAY HF

Citation: Dsy. Hsu et Hf. Gray, CONFORMAL CHEMICAL BEAM DEPOSITION OF THIN METAL-FILM FOR FABRICATINGHIGH-DENSITY TRENCH CAPACITOR CELLS, Applied physics letters, 63(2), 1993, pp. 159-161