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Results:
1-9
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Results: 9
Authors:
FARROW RC
POSTEK MT
KEERY WJ
JONES SN
LOWNEY JR
BLAKEY M
FETTER LA
GRIFFITH JE
LIDDLE JA
HOPKINS LC
HUGGINS HA
PEABODY M
NOVEMBRE A
Citation: Rc. Farrow et al., APPLICATION OF TRANSMISSION ELECTRON DETECTION TO SCALPEL MASK METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2167-2172
Authors:
HARRIOTT LR
BERGER SD
BIDDICK C
BLAKEY MI
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
DEMARCO R
FARROW RC
FELKER JA
FETTER L
FREEMAN R
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
LIDDLE JA
MKRTYCHAN M
NOVEMBRE AE
PEABODY ML
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WERDER KS
WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480
Authors:
WIESER J
MURNICK DE
ULRICH A
HUGGINS HA
LIDDLE A
BROWN WL
Citation: J. Wieser et al., VACUUM-ULTRAVIOLET RARE-GAS EXCIMER LIGHT-SOURCE, Review of scientific instruments, 68(3), 1997, pp. 1360-1364
Authors:
HARRIOTT LR
BERGER SD
BIDDICK C
BLAKEY MI
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
DIMARCO R
FARROW RC
FELKER JA
FETTER L
FREEMAN R
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
LIDDLE JA
MKRTYCHAN M
NOVEMBRE AE
PEABODY ML
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WERDER KS
WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828
Authors:
LIDDLE JA
BERGER SD
BIDDICK CJ
BLAKEY MI
BOLAN KJ
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
FARROW RC
FELKER JA
FETTER LA
FREEMAN B
HARRIOTT LR
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
MIXON DA
MKRTCHYAN MM
NOVEMBRE AE
PEABODY ML
SIMPSON WM
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WILLIAMS JK
WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
Authors:
LIDDLE JA
HUGGINS HA
WATSON GP
Citation: Ja. Liddle et al., ERROR BUDGET ANALYSIS OF THE SCALPEL(R) MASK FOR SUB-0.2 MU-M LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2483-2487
Authors:
TARASCON RG
NOVEMBRE AE
BOLAN K
BLAKEY M
KNUREK C
FETTER L
HUGGINS HA
LIDDLE JA
NALAMASU O
Citation: Rg. Tarascon et al., LITHOGRAPHIC EVALUATION OF A POSITIVE-ACTING CHEMICALLY AMPLIFIED RESIST SYSTEM UNDER CONVENTIONAL AND PROJECTION ELECTRON-BEAM EXPOSURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2975-2979
Authors:
TARASCON RG
BOLAN K
BLAKEY M
CAMARDA RM
FARROW RC
FETTER LA
HUGGINS HA
KRAUS JS
LIDDLE JA
MIXON DA
NOVEMBRE AE
WATSON GP
BERGER SD
Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448
Authors:
FARROW RC
LIDDLE JA
BERGER SD
HUGGINS HA
KRAUS JS
CAMARDA RM
TARASCON RG
JURGENSEN CW
KOLA RR
FETTER L
Citation: Rc. Farrow et al., MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2175-2178
Risultati:
1-9
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