Authors:
HUGHESOLIVER JM
LU JC
DAVIS JC
GYURCSIK RS
Citation: Jm. Hughesoliver et al., ACHIEVING UNIFORMITY IN A SEMICONDUCTOR FABRICATION PROCESS USING SPATIAL MODELING (VOL 93, PG 36, 1998), Journal of the American Statistical Association, 93(443), 1998, pp. 1252-1252
Authors:
HUGHESOLIVER JM
LU JC
DAVIS JC
GYURCSIK RS
Citation: Jm. Hughesoliver et al., ACHIEVING UNIFORMITY IN A SEMICONDUCTOR FABRICATION PROCESS USING SPATIAL MODELING, Journal of the American Statistical Association, 93(441), 1998, pp. 36-45
Authors:
DAVIS JC
HUGHESOLIVER JM
LU JC
GYURCSIK RS
Citation: Jc. Davis et al., IMPROVED WITHIN-WAFER UNIFORMITY MODELING THROUGH THE USE OF MAXIMUM-LIKELIHOOD-ESTIMATION OF THE MEAN AND COVARIANCE SURFACES (VOL 143, PG3404, 1996), Journal of the Electrochemical Society, 143(12), 1996, pp. 4129-4129
Authors:
DAVIS JC
HUGHESOLIVER JM
LU JC
GYURCSIK RS
Citation: Jc. Davis et al., IMPROVED WITHIN-WAFER UNIFORMITY MODELING THROUGH THE USE OF MAXIMUM-LIKELIHOOD-ESTIMATION OF THE MEAN AND COVARIANCE SURFACES, Journal of the Electrochemical Society, 143(10), 1996, pp. 3404-3409
Citation: Jm. Hughesoliver et Wh. Swallow, A 2-STAGE ADAPTIVE GROUP-TESTING PROCEDURE FOR ESTIMATING SMALL PROPORTIONS, Journal of the American Statistical Association, 89(427), 1994, pp. 982-993