Authors: Hamelmann, F Aschentrup, A Schmalhorst, J Kleineberg, U Heinzmann, U Dittmar, K Jutzi, P

Citation: F. Hamelmann et al., Silicon oxide nanolayers for soft X-ray optics produced by plasma enhancedCVD, J PHYS IV, 11(PR3), 2001, pp. 431-436

Authors: Klipp, A Hamelmann, F Haindl, G Hartwich, J Kleineberg, U Jutzi, P Heinzmann, U

Citation: A. Klipp et al., Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films, CHEM VAPOR, 6(2), 2000, pp. 63

Authors: Hamelmann, F Haindl, G Schmalhorst, J Aschentrup, A Majkova, E Kleineberg, U Heinzmann, U Klipp, A Jutzi, P Anopchenko, A Jergel, M Luby, S

Citation: F. Hamelmann et al., Metal oxide/silicon oxide multilayer with smooth interfaces produced by insitu controlled plasma-enhanced MOCVD, THIN SOL FI, 358(1-2), 2000, pp. 90-93

Authors: Kleineberg, U Menke, D Hamelmann, F Heinzmann, U Schmidt, O Fecher, GH Schoenhense, G

Citation: U. Kleineberg et al., Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY, J ELEC SPEC, 103, 1999, pp. 931-936

Authors: Luby, S Jergel, M Anopchenko, A Aschentrup, A Hamelmann, F Majkova, E Kleineberg, U Heinzmann, U

Citation: S. Luby et al., Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing, APPL SURF S, 150(1-4), 1999, pp. 178-184

Authors: Hamelmann, F Petri, SHA Klipp, A Haindl, G Hartwich, J Dreeskornfeld, L Kleineberg, U Jutzi, P Heinzmann, U

Citation: F. Hamelmann et al., W/Si multilayers deposited by hot-filament MOCVD, THIN SOL FI, 338(1-2), 1999, pp. 70-74