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Results: 1-8 |
Results: 8

Authors: Niu, GF Liang, QQ Cressler, JD Webster, CS Harame, DL
Citation: Gf. Niu et al., RF linearity characteristics of SiGeHBTs, IEEE MICR T, 49(9), 2001, pp. 1558-1565

Authors: Harame, DL Meyerson, BS
Citation: Dl. Harame et Bs. Meyerson, The early history of IBM's SiGe mixed signal technology, IEEE DEVICE, 48(11), 2001, pp. 2555-2567

Authors: Niu, GF Cressler, JD Zhang, SM Ansley, WE Webster, CS Harame, DL
Citation: Gf. Niu et al., A unified approach to RF and microwave noise parameter modeling in bipolartransistors, IEEE DEVICE, 48(11), 2001, pp. 2568-2574

Authors: Harame, DL Ahlgren, DC Coolbaugh, DD Dunn, JS Freeman, GG Gillis, JD Groves, RA Hendersen, GN Johnson, RA Joseph, AJ Subbanna, S Victor, AM Watson, KM Webster, CS Zampardi, PJ
Citation: Dl. Harame et al., Current status and future trends of SiGeBiCMOS technology, IEEE DEVICE, 48(11), 2001, pp. 2575-2594

Authors: Niu, GF Cressler, JD Shoga, M Jobe, K Chu, P Harame, DL
Citation: Gf. Niu et al., Simulation of SEE-induced charge collection in UHV/CVD SiGeHBTs, IEEE NUCL S, 47(6), 2000, pp. 2682-2689

Authors: Gogineni, U Cressler, JD Niu, G Harame, DL
Citation: U. Gogineni et al., Hot electron and hot hole degradation of UHV/CVD SiGeHBT's, IEEE DEVICE, 47(7), 2000, pp. 1440-1448

Authors: Salmon, SL Cressler, JD Jaeger, RC Harame, DL
Citation: Sl. Salmon et al., The influence of Ge grading on the bias and temperature characteristics ofSiGeHBT's for precision analog circuits, IEEE DEVICE, 47(2), 2000, pp. 292-298

Authors: Niu, GF Zhang, SM Cressler, JD Joseph, AJ Fairbanks, JS Larson, LE Webster, CS Ansley, WE Harame, DL
Citation: Gf. Niu et al., Noise modeling and SiGe profile design tradeoffs for RF applications, IEEE DEVICE, 47(11), 2000, pp. 2037-2044
Risultati: 1-8 |