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Results:
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Results: 17
Authors:
Doh, HH
Horiike, Y
Citation: Hh. Doh et Y. Horiike, Gas residence time effects on plasma parameters: Comparison between Ar andC4F8, JPN J A P 1, 40(5A), 2001, pp. 3419-3426
Authors:
Yoshiki, H
Horiike, Y
Citation: H. Yoshiki et Y. Horiike, Capacitively coupled microplasma source on a chip at atmospheric pressure, JPN J A P 2, 40(4A), 2001, pp. L360-L362
Authors:
Oki, A
Adachi, S
Takamura, Y
Ishihara, K
Ogawa, H
Ito, Y
Ichiki, T
Horiike, Y
Citation: A. Oki et al., Electroosmosis injection of blood serum into biocompatible microcapillary chip fabricated on quartz plate, ELECTROPHOR, 22(2), 2001, pp. 341-347
Authors:
Kuzumaki, T
Takamura, Y
Ichinose, H
Horiike, Y
Citation: T. Kuzumaki et al., Structural change at the carbon-nanotube tip by field emission, APPL PHYS L, 78(23), 2001, pp. 3699-3701
Authors:
Ujiie, T
Kikuchi, T
Ichiki, T
Horiike, Y
Citation: T. Ujiie et al., Fabrication of quartz microcapillary electrophoresis chips using plasma etching, JPN J A P 1, 39(6A), 2000, pp. 3677-3682
Authors:
Lee, PW
Kim, SS
Seo, SH
Chang, CS
Chang, HY
Ichiki, T
Horiike, Y
Citation: Pw. Lee et al., A new inside-type segmented coil antenna for uniformity control in a large-area inductively coupled plasma, JPN J A P 2, 39(6A), 2000, pp. L548-L550
Authors:
Chinzei, Y
Feurprier, Y
Ozawa, M
Kikuchi, T
Horioka, K
Ichiki, T
Horiike, Y
Citation: Y. Chinzei et al., High aspect ratio SiO2 etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether, J VAC SCI A, 18(1), 2000, pp. 158-165
Authors:
Fujieda, H
Horiike, Y
Yamamoto, T
Nomura, T
Citation: H. Fujieda et al., A wireless home network and its application (vol 46, pg 283, 2000), IEEE CONS E, 46(3), 2000, pp. 920-921
Authors:
Fujieda, H
Horiike, Y
Yamamoto, T
Nomura, T
Citation: H. Fujieda et al., A wireless home network and its application systems, IEEE CONS E, 46(2), 2000, pp. 283-290
Authors:
Oshio, H
Ichiki, T
Horiike, Y
Citation: H. Oshio et al., Run-to-run evolution of fluorocarbon radicals in C4F8 plasmas interacting with cold and hot inner walls, J ELCHEM SO, 147(11), 2000, pp. 4273-4278
Authors:
Ichiki, T
Takayanagi, S
Horiike, Y
Citation: T. Ichiki et al., Precise chrome etching in downstream chlorine plasmas with electron depletion through negative ion production, J ELCHEM SO, 147(11), 2000, pp. 4289-4293
Authors:
Shindo, H
Urayama, T
Fujii, T
Horiike, Y
Fujii, S
Citation: H. Shindo et al., Electron energy control in an inductively coupled plasma at low pressures, APPL PHYS L, 76(10), 2000, pp. 1246-1248
Authors:
Urayama, T
Niimi, H
Fujii, S
Horiike, Y
Shindo, H
Citation: T. Urayama et al., Thin film detection employing frequency shift in sheath current oscillation, JPN J A P 1, 38(8), 1999, pp. 4917-4921
Authors:
Shindo, H
Urayama, T
Fujii, T
Horiike, Y
Fujii, S
Citation: H. Shindo et al., Electron energy control in inductively coupled plasma employing multimode antenna, JPN J A P 2, 38(9AB), 1999, pp. L1066-L1069
Authors:
Fujii, T
Aoyagi, H
Kusaba, K
Horiike, Y
Shindo, H
Citation: T. Fujii et al., Enhancement of negative-ion-assisted silicon oxidation by radio-frequency bias, JPN J A P 2, 38(12A), 1999, pp. L1466-L1468
Authors:
Feurprier, Y
Chinzei, Y
Ogata, M
Kikuchi, T
Ozawa, M
Ichiki, T
Horiike, Y
Citation: Y. Feurprier et al., Microloading effect in ultrafine SiO2 hole/trench etching, J VAC SCI A, 17(4), 1999, pp. 1556-1561
Authors:
Shindo, H
Koromogawa, T
Fujii, T
Kusaba, K
Horiike, Y
Citation: H. Shindo et al., Negative ion assisted silicon oxidation with transformer coupled RF bias, SURF COAT, 119, 1999, pp. 618-621
Risultati:
1-17
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