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Results:
1-7
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Results: 7
Authors:
Mustapha, NM
Howson, RP
Citation: Nm. Mustapha et Rp. Howson, Reactive filtered arc evaporation, VACUUM, 60(3), 2001, pp. 361-368
Authors:
Erlat, AG
Henry, BM
Ingram, JJ
Mountain, DB
McGuigan, A
Howson, RP
Grovenor, CRM
Briggs, GAD
Tsukahara, Y
Citation: Ag. Erlat et al., Characterisation of aluminium oxynitride gas barrier films, THIN SOL FI, 388(1-2), 2001, pp. 78-86
Authors:
Stundzia, V
Biederman, H
Slavinska, D
Nedbal, J
Hlidek, P
Poskus, A
Mackus, PK
Howson, RP
Citation: V. Stundzia et al., Dielectric relaxation in hard, plasma-polymerized C : H films, J PHYS D, 33(6), 2000, pp. 719-724
Authors:
Bhagwat, S
Howson, RP
Citation: S. Bhagwat et Rp. Howson, Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films, SURF COAT, 111(2-3), 1999, pp. 163-171
Authors:
Henry, BM
Dinelli, F
Zhao, KY
Grovenor, CRM
Kolosov, OV
Briggs, GAD
Roberts, AP
Kumar, RS
Howson, RP
Citation: Bm. Henry et al., A microstructural study of transparent metal oxide gas barrier films, THIN SOL FI, 356, 1999, pp. 500-505
Authors:
Howson, RP
Danson, N
Safi, I
Citation: Rp. Howson et al., High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, fat substrates, THIN SOL FI, 351(1-2), 1999, pp. 32-36
Authors:
Safi, I
Howson, RP
Citation: I. Safi et Rp. Howson, The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content; comparisons with the use of tin as a dopant, THIN SOL FI, 344, 1999, pp. 115-118
Risultati:
1-7
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