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Citation: G. Pribil et al., Deposition of electronic quality amorphous silicon, a-Si : H, thin films by a hollow cathode plasma-jet reactive sputtering system, J VAC SCI A, 19(4), 2001, pp. 1571-1576

Authors: Hubicka, Z Sicha, M Pajasova, L Soukup, L Jastrabik, L Chvostova, D Wagner, T

Citation: Z. Hubicka et al., CNx coatings deposited by pulsed RF supersonic plasma jet: hardness, nitrogenation and optical properties, SURF COAT, 142, 2001, pp. 681-687

Authors: Kapicka, V Sicha, M Klima, M Hubicka, Z Tous, J Brablec, A Slavicek, P Behnke, JF Tichy, M Vaculik, R

Citation: V. Kapicka et al., The high pressure torch discharge plasma source, PLASMA SOUR, 8(1), 1999, pp. 15-21

Authors: Fendrych, F Soukup, L Jastrabik, L Sicha, M Hubicka, Z Chvostova, D Tarasenko, A Studnicka, V Wagner, T

Citation: F. Fendrych et al., Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties, DIAM RELAT, 8(8-9), 1999, pp. 1715-1719

Authors: Soukup, L Sicha, M Fendrych, F Jastrabik, L Hubicka, Z Chvostova, D Sichova, H Valvoda, V Tarasenko, A Studnicka, V Wagner, T Novak, M

Citation: L. Soukup et al., Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system, SURF COAT, 119, 1999, pp. 321-326