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Results: 3
The reactive ion etching of gallium nitride by methylchloride/hydrogen
Authors:
Dineen, M Thomas, H Humphreys, B McMeekin, SG
Citation:
M. Dineen et al., The reactive ion etching of gallium nitride by methylchloride/hydrogen, PHYS ST S-A, 176(1), 1999, pp. 739-742
Reactive ion etching of gallium nitride by methylchloride/hydrogen
Authors:
Dineen, M Thomas, H Humphreys, B McMeekin, SG
Citation:
M. Dineen et al., Reactive ion etching of gallium nitride by methylchloride/hydrogen, ELECTR LETT, 35(8), 1999, pp. 673-675
The application of high density plasma sources for optoelectronic device fabrication
Authors:
Humphreys, B Govett, M Goodyear, A
Citation:
B. Humphreys et al., The application of high density plasma sources for optoelectronic device fabrication, VACUUM, 51(4), 1998, pp. 511-517
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