Authors: YAMADA T INANAMI R MORITA S

Citation: T. Yamada et al., POLYIMIDE TRANSMITTED E-BEAM EXCITED CF4 PLASMA-ETCHING, Thin solid films, 316(1-2), 1998, pp. 13-17

Authors: INANAMI R YAMADA T OHSAKI S OGAWA S MORITA S

Citation: R. Inanami et al., 50 NM PATTERN ETCHING OF SI WAFER BY SYNCHROTRON-RADIATION EXCITED CF4 PLASMA, JPN J A P 1, 36(12B), 1997, pp. 7706-7709

Authors: SHAO CL MORITA S SOGA T INANAMI R HATTORI S

Citation: Cl. Shao et al., SYNCHROTRON-RADIATION-INDUCED DEPOSITION OF ETCH-PROTECTING FILM ON SI IN CF4 PLASMA, JPN J A P 1, 35(2A), 1996, pp. 765-766

Authors: INANAMI R MORITA S

Citation: R. Inanami et S. Morita, EFFECTS OF TRANSMITTED ELECTRONS ON INDUCTIVELY-COUPLED PLASMA-ETCHING OF A SI WAFER THROUGH AN AL MASK, Journal of the Electrochemical Society, 143(11), 1996, pp. 3752-3754

Authors: INANAMI R UCHIDA T MORITA S

Citation: R. Inanami et al., SI WAFER ETCHING WITH SYNCHROTRON-RADIATION IN A CF4 GAS ATMOSPHERE, Journal of the Electrochemical Society, 143(11), 1996, pp. 3754-3756

Authors: INANAMI R SHAO CL MORITA S

Citation: R. Inanami et al., SILICON-WAFER ETCHING BY TRANSMITTED ELECTRON-BEAM-ENHANCED PLASMA, Journal of the Electrochemical Society, 141(9), 1994, pp. 2541-2544