Authors:
Brox, O
Iltgen, K
Hellweg, S
Benninghoven, A
Citation: O. Brox et al., Determination of silicon oxide layer thickness by time-of-flight secondaryion mass spectroscopy, J VAC SCI B, 17(5), 1999, pp. 2191-2192
Authors:
Iltgen, K
Zschech, E
Ghatak-Roy, A
Hossain, T
Citation: K. Iltgen et al., Future in-fab applications of total reflection X-ray fluorescence spectrometry for the semiconductor industry, SPECT ACT B, 54(10), 1999, pp. 1393-1398