Citation: S. Oussalah et R. Jerisian, DIELECTRIC TESTING FOR INTEGRATED POWER DEVICES, Microelectronics and reliability, 37(10-11), 1997, pp. 1763-1766
Authors:
SAGNES B
MORAGUES JM
YCKACHE K
JERISIAN R
OUALID J
VUILLAUME D
Citation: B. Sagnes et al., RELAXATION OF THE SPACE-CHARGE CREATED BY FOWLER-NORDHEIM INJECTIONS IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS, Journal of applied physics, 80(9), 1996, pp. 5469-5477
Authors:
MORAGUES JM
SAGNES B
YCKACHE K
JERISIAN R
OUALID J
VUILLAUME D
Citation: Jm. Moragues et al., EXPERIMENTS AND MODELING TO DETERMINE TRAPPED HOLES AND SLOW STATES IN FOWLER-NORDHEIM STRESSED MOS CAPACITORS, Microelectronic engineering, 28(1-4), 1995, pp. 329-332
Authors:
CIANTAR E
BOIVIN P
BURLE M
NIEL C
MORAGUES JM
SAGNES B
JERISIAN R
OUALID J
Citation: E. Ciantar et al., INFLUENCE OF FN ELECTRON INJECTIONS IN DRY AND DRY WET DRY GATE OXIDES - RELATION WITH FAILURE, Journal of non-crystalline solids, 187, 1995, pp. 144-148
Authors:
MORAGUES JM
SAGNES B
JERISIAN R
OUALID J
CIANTAR E
LIOTARD JL
MERENDA P
Citation: Jm. Moragues et al., INFLUENCE OF WSI2 POLYSILICIDE GATE PROCESS ON INTEGRITY AND RELIABILITY OF GATE AND TUNNEL OXIDES, Journal of non-crystalline solids, 187, 1995, pp. 156-159
Authors:
MORAGUES JM
CIANTAR E
JERISIAN R
SAGNES B
OUALID J
Citation: Jm. Moragues et al., SURFACE-POTENTIAL DETERMINATION IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS, Journal of applied physics, 76(9), 1994, pp. 5278-5287
Authors:
OUALID J
BURGNIARD S
CIANTAR E
JERISIAN R
Citation: J. Oualid et al., HOT-CARRIER EFFECTS ON LEAKAGE CURRENTS IN MOSFETS - MODELING AND EXPERIMENT, Microelectronics and reliability, 33(11-12), 1993, pp. 1759-1777
Authors:
MORAGUES JM
OUALID J
JERISIAN R
CIANTAR E
Citation: Jm. Moragues et al., EFFECTS OF HIGH-FIELD ELECTRON INJECTION INTO THE GATE OXIDE OF P-CHANNEL METAL-OXIDE-SEMICONDUCTOR TRANSISTORS, Journal of applied physics, 74(8), 1993, pp. 5078-5085
Authors:
SEGHIR H
CRISTOLOVEANU S
JERISIAN R
OUALID J
AUBERTONHERVE AJ
Citation: H. Seghir et al., CORRELATION OF THE LEAKAGE CURRENT AND CHARGE PUMPING IN SILICON-ON-INSULATOR GATE-CONTROLLED DIODES, I.E.E.E. transactions on electron devices, 40(6), 1993, pp. 1104-1111
Citation: R. Jerisian et al., THE BEHAVIOR OF SINTERED CERAMICS AND FILMS OF TITANIUM-DIOXIDE SUBJECTED TO NONEQUILIBRIUM GAS-MIXTURES, FOR STEADY-STATE CONDITIONS - THEIR USE AS OXYGEN RESISTIVE SENSORS, Journal de physique. III, 2(4), 1992, pp. 679-699