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Authors: TOMITA T UTSUNOMIYA H KAMAKURA Y TANIGUCHI K

Citation: T. Tomita et al., HOT HOLE INDUCED BREAKDOWN OF THIN SILICON DIOXIDE FILMS, Applied physics letters, 71(25), 1997, pp. 3664-3666

Authors: KAMAKURA Y MIZUNO H YAMAJI M MORIFUJI M TANIGUCHI K HAMAGUCHI C KUNIKIYO T TAKENAKA M

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Citation: A. Abramo et al., A COMPARISON OF NUMERICAL-SOLUTIONS OF THE BOLTZMANN TRANSPORT-EQUATION FOR HIGH-ENERGY ELECTRON-TRANSPORT SILICON, I.E.E.E. transactions on electron devices, 41(9), 1994, pp. 1646-1654