Authors:
JACOBSON DC
KAMGAR A
EAGLESHAM DJ
LLOYD EJ
HILLENIUS SJ
POATE JM
Citation: Dc. Jacobson et al., HIGH-ENERGY ION-IMPLANTATION FOR PROFILED TUB FORMATION AND IMPURITY GETTERING IN DEEP-SUBMICRON CMOS TECHNOLOGY, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 96(1-2), 1995, pp. 416-419
Authors:
KAMGAR A
HILLENIUS SJ
BAKER RM
NAKAHARA S
BECHTOLD PF
Citation: A. Kamgar et al., GATE OXIDE THINNING AT THE ACTIVE DEVICE FOX BOUNDARY IN SUBMICROMETER PBL ISOLATION/, I.E.E.E. transactions on electron devices, 42(12), 1995, pp. 2089-2095