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Results:
1-12
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Results: 12
Authors:
KOYANO I
OKUYAMA M
ISHIGURO E
HIRAYA A
OHASHI H
KANASHIMA T
UEDA K
SUZUKI IH
IBUKI T
Citation: I. Koyano et al., SOFT-X-RAY PHOTOCHEMISTRY BEAMLINE AT SPRING-8, Journal of synchrotron radiation, 5, 1998, pp. 545-547
Authors:
OKUYAMA M
OISHI Y
MATSUMURO Y
KANASHIMA T
Citation: M. Okuyama et al., BASIC CHARACTERISTICS OF SRBI2TA2O9 SIO2/SI STRUCTURE/, Journal of the Korean Physical Society, 32, 1998, pp. 1357-1360
Authors:
MAIDA O
YAMAMOTO H
OKADA N
KANASHIMA T
OKUYAMA M
Citation: O. Maida et al., ELECTRONIC CHARACTERIZATION OF SI SIO2 STRUCTURE USING PHOTO-CVD SIO2THIN-FILM ON ATOMICALLY FLAT SI SUBSTRATE/, Applied surface science, 132, 1998, pp. 214-220
Authors:
KANASHIMA T
KURIOKA Y
IMAI T
YAMAMOTO H
OKUYAMA M
Citation: T. Kanashima et al., CHARACTERIZATION OF F2 TREATMENT EFFECTS ON SI(100) SURFACE AND SI(100) SIO2 INTERFACE/, JPN J A P 1, 36(4B), 1997, pp. 2460-2463
Authors:
KANASHIMA T
OKUYAMA M
HAMAKAWA Y
Citation: T. Kanashima et al., ANALYSIS OF SI-H, SI-O-H AND SI-O-O-H DEFECTS IN SIO2 THIN-FILM BY MOLECULAR-ORBITAL METHOD, JPN J A P 1, 36(3B), 1997, pp. 1448-1452
Authors:
OKUYAMA M
WU WB
OISHI Y
KANASHIMA T
Citation: M. Okuyama et al., DIELECTRIC PROPERTY OF FERROELECTRIC-INSULATOR-SEMICONDUCTOR JUNCTION, Applied surface science, 117, 1997, pp. 406-412
Authors:
YAMAMOTO H
OKUMURA K
OYA T
KANASHIMA T
OKUYAMA M
HAMAKAWA Y
Citation: H. Yamamoto et al., SURFACE-TREATMENT EFFECTS ON MICROSCOPIC SI SURFACE-STRUCTURE AND SI-SIO2 INTERFACE STATE, Applied surface science, 114, 1997, pp. 664-669
Authors:
KANASHIMA T
OKUYAMA M
HAMAKAWA Y
Citation: T. Kanashima et al., THEORETICAL-ANALYSIS OF OXYGEN-EXCESS DEFECTS IN SIO2 THIN-FILM BY MOLECULAR-ORBITAL METHOD, JPN J A P 1, 35(2B), 1996, pp. 1445-1449
Authors:
YAMAMOTO H
IWASAKI S
OKUMURA K
KANASHIMA T
OKUYAMA M
HAMAKAWA Y
Citation: H. Yamamoto et al., CHARACTERIZATION OF CHARGED TRAPS NEAR SI-SIO2 INTERFACE IN PHOTOINDUCED CHEMICAL-VAPOR-DEPOSITED SIO2 FILM, JPN J A P 1, 35(2B), 1996, pp. 1569-1572
Authors:
KANASHIMA T
OKUYAMA M
HAMAKAWA Y
Citation: T. Kanashima et al., PHOTOLUMINESCENCE OF SIO2-FILMS GROWN BY PHOTOINDUCED CHEMICAL-VAPOR-DEPOSITION, Applied surface science, 80, 1994, pp. 321-326
Authors:
KANASHIMA T
OKUYAMA M
HAMAKAWA Y
Citation: T. Kanashima et al., PHOTOLUMINESCENCE AND ITS EXCIMER-LASER IRRADIATION EFFECTS IN SIO2 FILM PREPARED BY PHOTOINDUCED CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 32(6B), 1993, pp. 3113-3119
Authors:
KANASHIMA T
NAGAYOSHI R
OKUYAMA M
HAMAKAWA Y
Citation: T. Kanashima et al., OPTICAL CHARACTERIZATIONS OF PHOTOINDUCED CHEMICAL-VAPOR-DEPOSITION PRODUCED SIO2-FILMS IN VACUUM-ULTRAVIOLET, ULTRAVIOLET, AND VISIBLE REGION, Journal of applied physics, 74(9), 1993, pp. 5742-5747
Risultati:
1-12
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