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Citation: I. Kashkoush et al., IN-SITU CHEMICAL CONCENTRATION CONTROL FOR WAFER WET CLEANING, Journal of the IEST, 41(3), 1998, pp. 24-30

Authors: BUSNAINA A TAYLOR J KASHKOUSH I

Citation: A. Busnaina et al., MEASUREMENT OF THE ADHESION AND REMOVAL FORCES OF SUBMICROMETER PARTICLES ON SILICON SUBSTRATES, Journal of adhesion science and technology, 7(5), 1993, pp. 441-455

Authors: BUSNAINA A KASHKOUSH I

Citation: A. Busnaina et I. Kashkoush, THE EFFECT OF TIME, TEMPERATURE AND PARTICLE-SIZE ON SUBMICRON PARTICLE REMOVAL USING ULTRASONIC CLEANING, Chemical engineering communications, 125, 1993, pp. 47-61