Authors: KHRAMOVA LV SMIRNOVA TP EREMINA EG

Citation: Lv. Khramova et al., PRODUCTION OF SILICON OXYNITRIDE LAYERS BY USE OF HEXAMETHYLDISILAZANE AND NITROGEN(I) OXIDE, Inorganic materials, 28(8), 1992, pp. 1329-1332

Authors: SMIRNOVA TP KHRAMOVA LV YASHKIN IL BAKLANOV PY KICHAI VN SYSOEVA NP

Citation: Tp. Smirnova et al., PREPARATION OF BORON-NITRIDE FILMS BY INDIRECT HIGH-FREQUENCY ACTIVATION OF BORAZOLE, Inorganic materials, 28(7), 1992, pp. 1118-1122