Citation: Mg. Rosenfield et al., ELECTRON-BEAM LITHOGRAPHY FOR ADVANCED DEVICE PROTOTYPING - PROCESS TOOL METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2615-2620
Authors:
REEVES CM
WIND SJ
HOHN FJ
BUCCHIGNANO JJ
LII YT
KLAUS DP
Citation: Cm. Reeves et al., FABRICATION AND CHARACTERIZATION OF COMPACT 100NM SCALE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS, Microelectronic engineering, 21(1-4), 1993, pp. 409-418