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Results: 1-8 |
Results: 8
NANOLITHOGRAPHY BY DISPLACEMENT OF CATALYTIC METAL-CLUSTERS USING AN ATOMIC-FORCE MICROSCOPE TIP
Authors: BRANDOW SL DRESSICK WJ DULCEY CS KOLOSKI TS SHIREY LM SCHMIDT J CALVERT JM
Citation: Sl. Brandow et al., NANOLITHOGRAPHY BY DISPLACEMENT OF CATALYTIC METAL-CLUSTERS USING AN ATOMIC-FORCE MICROSCOPE TIP, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(5), 1997, pp. 1818-1824
PROXIMAL PROBE STUDY OF SELF-ASSEMBLED MONOLAYER RESIST MATERIALS
Authors: PERKINS FK DOBISZ EA BRANDOW SL KOLOSKI TS CALVERT JM RHEE KW KOSAKOWSKI JE MARRIAN CRK
Citation: Fk. Perkins et al., PROXIMAL PROBE STUDY OF SELF-ASSEMBLED MONOLAYER RESIST MATERIALS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3725-3730
NUCLEOPHILIC DISPLACEMENT-REACTIONS AT BENZYL HALIDE SELF-ASSEMBLED MONOLAYER FILM SURFACES
Authors: KOLOSKI TS DULCEY CS HARALSON QJ CALVERT JM
Citation: Ts. Koloski et al., NUCLEOPHILIC DISPLACEMENT-REACTIONS AT BENZYL HALIDE SELF-ASSEMBLED MONOLAYER FILM SURFACES, Langmuir, 10(9), 1994, pp. 3122-3133
MONOBIS(SILYL) AND BIS(SILYL) COMPLEXES OF MOLYBDENUM AND TUNGSTEN - SYNTHESIS, STRUCTURES, AND SI-29 NMR TRENDS
Authors: KOLOSKI TS PESTANA DC CARROLL PJ BERRY DH
Citation: Ts. Koloski et al., MONOBIS(SILYL) AND BIS(SILYL) COMPLEXES OF MOLYBDENUM AND TUNGSTEN - SYNTHESIS, STRUCTURES, AND SI-29 NMR TRENDS, Organometallics, 13(2), 1994, pp. 489-499
REDISTRIBUTION OF METHYL-GROUPS BETWEEN SILICON CENTERS IN BIS(SILYL)TUNGSTEN COMPLEXES - SILYL SILYLENE COMPLEX INTERMEDIATES AS THE SOURCE OF INTERLIGAND REACTIVITY
Authors: PESTANA DC KOLOSKI TS BERRY DH
Citation: Dc. Pestana et al., REDISTRIBUTION OF METHYL-GROUPS BETWEEN SILICON CENTERS IN BIS(SILYL)TUNGSTEN COMPLEXES - SILYL SILYLENE COMPLEX INTERMEDIATES AS THE SOURCE OF INTERLIGAND REACTIVITY, Organometallics, 13(11), 1994, pp. 4173-4175
LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY IN SELF-ASSEMBLED ULTRATHIN FILMS WITH THE SCANNING TUNNELING MICROSCOPE
Authors: MARRIAN CRK PERKINS FK BRANDOW SL KOLOSKI TS DOBISZ EA CALVERT JM
Citation: Crk. Marrian et al., LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY IN SELF-ASSEMBLED ULTRATHIN FILMS WITH THE SCANNING TUNNELING MICROSCOPE, Applied physics letters, 64(3), 1994, pp. 390-392
SOFT-X-RAY PHOTOCHEMISTRY OF CHEMISORBED SELF-ASSEMBLED MONOLAYERS
Authors: SUH D SIMONS JK TAYLOR JW KOLOSKI TS CALVERT JM
Citation: D. Suh et al., SOFT-X-RAY PHOTOCHEMISTRY OF CHEMISORBED SELF-ASSEMBLED MONOLAYERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2850-2854
PROJECTION X-RAY-LITHOGRAPHY WITH ULTRATHIN IMAGING LAYERS AND SELECTIVE ELECTROLESS METALLIZATION
Authors: CALVERT JM KOLOSKI TS DRESSICK WJ DULCEY CS PECKERAR MC CERRINA F TAYLOR JW SUH DW WOOD OR MACDOWELL AA DSOUZA R
Citation: Jm. Calvert et al., PROJECTION X-RAY-LITHOGRAPHY WITH ULTRATHIN IMAGING LAYERS AND SELECTIVE ELECTROLESS METALLIZATION, Optical engineering, 32(10), 1993, pp. 2437-2445
Risultati: 1-8 |