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Results:
1-7
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Results: 7
Authors:
HOULIHAN FM
NALAMASU O
KOMETANI JM
REICHMANIS E
Citation: Fm. Houlihan et al., A RETROSPECTIVE ON 2-NITROBENZYL SULFONATE PHOTOACID GENERATORS, Journal of imaging science and technology, 41(1), 1997, pp. 35-40
Authors:
NOVEMBRE AE
KOMETANI JM
KNUREK CS
KUMAR U
NEENAN TX
MIXON DA
NALAMASU O
MUNZEL N
Citation: Ae. Novembre et al., IDENTIFICATION OF SENSITIVE POSITIVE AND NEGATIVE WORKING RESIST MATERIALS FOR PROXIMITY X-RAY-LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 389-392
Authors:
SCHILLING ML
KATZ HE
HOULIHAN FM
KOMETANI JM
STEIN SM
NALAMASU O
Citation: Ml. Schilling et al., PHOTOGENERATED ACID-CATALYZED FORMATION OF PHOSPHONIC PHOSPHORIC-ACIDS BY DEPROTECTION OF ESTERS IN POLYMER-FILMS, Macromolecules, 28(1), 1995, pp. 110-115
Authors:
UHRICH KE
REICHMANIS E
HEFFNER SA
KOMETANI JM
NALAMASU O
Citation: Ke. Uhrich et al., NOVEL PHOTORESISTS INCORPORATING [(TRIMETHYLSILYL)OXY]STYRENE, Chemistry of materials, 6(3), 1994, pp. 287-294
Authors:
UHRICH KE
REICHMANIS E
HEFFNER SA
KOMETANI JM
Citation: Ke. Uhrich et al., FORMATION OF POLYMERS CONTAINING 4-HYDROXYSTYRENE VIA HYDROLYSIS OF 4-((TRIMETHYLSILYL)OXY)STYRENE, Macromolecules, 27(18), 1994, pp. 4936-4940
Authors:
NEENAN TX
KUMAR U
KOMETANI JM
NOVEMBRE AE
Citation: Tx. Neenan et al., SINGLE-COMPONENT DEEP-ULTRAVIOLET AND X-RAY RESISTS - THE LITHOGRAPHIC BEHAVIOR OF LY[(2-METHYL-4-T-BUTOXYCARBONYLOXYSTYRENE)SULFONE] AND LY[(3-CHLORO-4-T-BUTOXYCARBONYLOXYSTYRENE)SULFONE], Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2779-2782
Authors:
KOMETANI JM
GALVIN ME
HEFFNER SA
HOULIHAN FM
NALAMASU O
CHIN E
REICHMANIS E
Citation: Jm. Kometani et al., A NOVEL-APPROACH TO INDUCING AQUEOUS BASE SOLUBILITY IN SUBSTITUTED STYRENE SULFONE POLYMERS, Macromolecules, 26(9), 1993, pp. 2165-2170
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