Authors:
KWOK CY
WILLIAMS A
GROSS M
GAUJA E
KONG SO
Citation: Cy. Kwok et al., EFFECTS OF CONTROLLED TEXTURIZATION OF THE CRYSTALLINE SI SURFACE ON THE SIO2 SI EFFECTIVE BARRIER HEIGHT/, IEEE electron device letters, 15(12), 1994, pp. 513-515
Citation: So. Kong et Cy. Kwok, FOWLER-NORDHEIM TUNNELING CURRENT IN A YTTRIUM SILICON DIOXIDE SILICON MOS STRUCTURE, Solid-state electronics, 37(1), 1994, pp. 189-191
Citation: So. Kong et Cy. Kwok, FOWLER-NORDHEIM TUNNELING CURRENT IN A MG POLYCRYSTALLINE SI OXIDE/N+POLYCRYSTALLINE SI METAL-OXIDE-SILICON STRUCTURE/, Applied physics letters, 63(19), 1993, pp. 2667-2669