Authors: CURRENT M KUMP M MCGUIRE G

Citation: M. Current et al., PAPERS FROM THE 4TH INTERNATIONAL WORKSHOP ON THE MEASUREMENT AND CHARACTERIZATION OF ULTRA-SHALLOW DOPING PROFILES IN SEMICONDUCTORS - 6-9APRIL 1997 MCNC, CENTER-FOR-MICROELECTRONICS RESEARCH-TRIANGLE-PARK, NORTH-CAROLINA - PREFACE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 259-259

Authors: CURRENT MI MATHUR R KUMP M LARSON LA

Citation: Mi. Current et al., PROCESS SIMULATION CHALLENGES FOR ULSI DEVICES - A USERS PERSPECTIVE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 102(1-4), 1995, pp. 198-201