Authors: SHINADA T KUMURA Y OKABE J MATSUKAWA T OHDOMARI I

Citation: T. Shinada et al., CURRENT STATUS OF SINGLE-ION IMPLANTATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2489-2493

Authors: SHINADA T KIMURA H KUMURA Y OHDOMARI I

Citation: T. Shinada et al., DAMAGE AND CONTAMINATION FREE FABRICATION OF THIN SI WIRES WITH HIGHLY CONTROLLED FEATURE SIZE, Applied surface science, 117, 1997, pp. 684-689