Authors: Liddle, JA Blakey, MI Bolan, K Farrow, RC Gallatin, GM Kasica, R Katsap, V Knurek, CS Li, J Mkrtchyan, M Novembre, AE Ocola, L Orphanos, PA Peabody, ML Stanton, ST Teffeau, K Waskiewicz, WK Munro, E

Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481

Authors: Farrow, RC Waskiewicz, WK Kizilyalli, I Ocola, L Felker, J Biddick, C Gallatin, G Mkrtchyan, M Blakey, M Kraus, J Novembre, A Orphanos, P Peabody, M Kasica, R Kornblit, A Klemens, F

Citation: Rc. Farrow et al., CMOS compatible alignment marks for the SCALPEL proof of lithography tool, MICROEL ENG, 46(1-4), 1999, pp. 263-266

Authors: Farrow, RC Novembre, AE Peabody, M Kasica, R Blakey, M Liddle, JA Werder, K DeMarco, R Ocola, L Rutberg, L Saunders, T Unruh, J Qian, F Smith, M

Citation: Rc. Farrow et al., Commercialization of SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3582-3586